Jozef Brcka

Person

Loundonville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ionized physical vapor deposition (IPVD) apparatus and method for a...
- Patent number 10,672,596
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Poly-phased inductively coupled plasma source
- Patent number 10,431,425
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for dielectrophoresis (DEP) separation
- Patent number 10,413,913
- Issue date Sep 17, 2019
- Tokyo Electron Limited
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Method of cleaning the filament and reactor's interior in FACVD
- Patent number 10,066,293
- Issue date Sep 4, 2018
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for tissue construction using an electric field a...
- Patent number 9,228,261
- Issue date Jan 5, 2016
- Tokyo Electron Limited
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Method and device for controlling pattern and structure formation b...
- Patent number 8,916,055
- Issue date Dec 23, 2014
- Tokyo Electron Limited
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Multi-zone gas distribution system for a treatment system
- Patent number 8,715,455
- Issue date May 6, 2014
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple gas plasma forming method and ICP source
- Patent number 8,480,914
- Issue date Jul 9, 2013
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of ion angular distribution function at wafer surface
- Patent number 8,409,398
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma fluid modeling with transient to stochastic transformation
- Patent number 8,103,492
- Issue date Jan 24, 2012
- Tokyo Electron Limited
- Jozef Brcka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus of distributed plasma processing system for co...
- Patent number 8,092,658
- Issue date Jan 10, 2012
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system with locally-efficient inductive plasma co...
- Patent number 8,028,655
- Issue date Oct 4, 2011
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded multi-inductive large area plasma source
- Patent number 7,976,674
- Issue date Jul 12, 2011
- Tokyo Electron Limited
- Jozef Brcka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Control of ion angular distribution function at wafer surface
- Patent number 7,867,409
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulated gap segmented antenna for inductively-coupled plasma proc...
- Patent number 7,854,213
- Issue date Dec 21, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system with locally-efficient inductive plasma co...
- Patent number 7,810,449
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective-redeposition structures for calibrating a plasma process
- Patent number 7,776,748
- Issue date Aug 17, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch system with integrated inductive coupling
- Patent number 7,771,562
- Issue date Aug 10, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RLSA CVD deposition control using halogen gas for hydrogen scavenging
- Patent number 7,763,551
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective-redeposition sources for calibrating a plasma process
- Patent number 7,749,398
- Issue date Jul 6, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ionized PVD with sequential deposition and etching
- Patent number 7,744,735
- Issue date Jun 29, 2010
- Tokyo Electron Limited
- Rodney Lee Robison
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Locally-efficient inductive plasma coupling for plasma processing s...
- Patent number 7,673,583
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid precursor vaporization system for use in chemical vapor depos...
- Patent number 7,651,570
- Issue date Jan 26, 2010
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced reliability deposition baffle for iPVD
- Patent number 7,591,935
- Issue date Sep 22, 2009
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for saturating a carrier gas with precursor vapor
- Patent number 7,566,477
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly ionized PVD with moving magnetic field envelope for uniform...
- Patent number 7,556,718
- Issue date Jul 7, 2009
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact, distributed inductive element for large scale inductively-...
- Patent number 7,464,662
- Issue date Dec 16, 2008
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced atomic layer deposition system and method
- Patent number 7,435,454
- Issue date Oct 14, 2008
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated electrostatic inductive coupling for plasma processing
- Patent number 7,426,900
- Issue date Sep 23, 2008
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring the thickness of a conductive c...
- Patent number 7,407,324
- Issue date Aug 5, 2008
- Tokyo Electron, Ltd.
- Jozef Brcka
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Methods and Systems for Dielectrophoresis (DEP) Separation
- Publication number 20180229246
- Publication date Aug 16, 2018
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For A...
- Publication number 20170278686
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Poly-phased Inductively Coupled Plasma Source
- Publication number 20170243720
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...
- Publication number 20150152556
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD
- Publication number 20150044390
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...
- Publication number 20130217210
- Publication date Aug 22, 2013
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
SYSTEM AND METHOD FOR TISSUE CONSTRUCTION USING AN ELECTRIC FIELD...
- Publication number 20130192990
- Publication date Aug 1, 2013
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
MULTIPLE GAS PLASMA FORMING METHOD AND ICP SOURCE
- Publication number 20120329283
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW PLATE UTILIZATION IN FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION
- Publication number 20110244128
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD
- Publication number 20110232567
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING SYSTEM WITH LOCALLY-EFFICIENT INDUCTIVE PLASMA CO...
- Publication number 20110146911
- Publication date Jun 23, 2011
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF ION ANGULAR DISTRIBUTION FUNCTION AT WAFER SURFACE
- Publication number 20110079355
- Publication date Apr 7, 2011
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA FLUID MODELING WITH TRANSIENT TO STOCHASTIC TRANSFORMATION
- Publication number 20100063787
- Publication date Mar 11, 2010
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING
- Publication number 20090241310
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING
- Publication number 20090242396
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM WITH LOCALLY-EFFICIENT INDUCTIVE PLASMA CO...
- Publication number 20090200949
- Publication date Aug 13, 2009
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED MULTI-INDUCTIVE LARGE AREA PLASMA SOURCE
- Publication number 20080308409
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTROL OF ION ANGULAR DISTRIBUTION FUNCTION AT WAFER SURFACE
- Publication number 20080242065
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFLOW INTEGRATED ICP SOURCE
- Publication number 20080236491
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS DISTRIBUTION SYSTEM FOR A TREATMENT SYSTEM
- Publication number 20080185104
- Publication date Aug 7, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE-REDEPOSITION SOURCES FOR CALIBRATING A PLASMA PROCESS
- Publication number 20080087638
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE-REDEPOSITION STRUCTURES FOR CALIBRATING A PLASMA PROCESS
- Publication number 20080081482
- Publication date Apr 3, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF DISTRIBUTED PLASMA PROCESSING SYSTEM FOR CO...
- Publication number 20080026574
- Publication date Jan 31, 2008
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced reliability deposition baffle for iPVD
- Publication number 20070131544
- Publication date Jun 14, 2007
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR DEPOSITING MATERIAL ON A SUBSTRATE USING A SO...
- Publication number 20070113789
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCH SYSTEM WITH INTEGRATED INDUCTIVE COUPLING
- Publication number 20070113981
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hollow body plasma uniformity adjustment device and method
- Publication number 20070068795
- Publication date Mar 29, 2007
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for monitoring thickness of conductive coating
- Publication number 20070036198
- Publication date Feb 15, 2007
- Jozef Brcka
- G01 - MEASURING TESTING
Information Patent Application
Segmented biased peripheral electrode in plasma processing method a...
- Publication number 20070029193
- Publication date Feb 8, 2007
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Intelligent system for detection of process status, process fault a...
- Publication number 20060259198
- Publication date Nov 16, 2006
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- G05 - CONTROLLING REGULATING

Jozef Brcka

Person

Patents Grantslast 30 patents

Ionized physical vapor deposition (IPVD) apparatus and method for a...

Poly-phased inductively coupled plasma source

Methods and systems for dielectrophoresis (DEP) separation

Method of cleaning the filament and reactor's interior in FACVD

System and method for tissue construction using an electric field a...

Method and device for controlling pattern and structure formation b...

Multi-zone gas distribution system for a treatment system

Multiple gas plasma forming method and ICP source

Control of ion angular distribution function at wafer surface

Plasma fluid modeling with transient to stochastic transformation

Method and apparatus of distributed plasma processing system for co...

Plasma processing system with locally-efficient inductive plasma co...

Embedded multi-inductive large area plasma source

Control of ion angular distribution function at wafer surface

Modulated gap segmented antenna for inductively-coupled plasma proc...

Plasma processing system with locally-efficient inductive plasma co...

Selective-redeposition structures for calibrating a plasma process

Etch system with integrated inductive coupling

RLSA CVD deposition control using halogen gas for hydrogen scavenging

Selective-redeposition sources for calibrating a plasma process

Ionized PVD with sequential deposition and etching

Locally-efficient inductive plasma coupling for plasma processing s...

Solid precursor vaporization system for use in chemical vapor depos...

Enhanced reliability deposition baffle for iPVD

Method for saturating a carrier gas with precursor vapor

Highly ionized PVD with moving magnetic field envelope for uniform...

Compact, distributed inductive element for large scale inductively-...

Plasma enhanced atomic layer deposition system and method

Integrated electrostatic inductive coupling for plasma processing

Method and apparatus for monitoring the thickness of a conductive c...

Patents Applicationslast 30 patents

Methods and Systems for Dielectrophoresis (DEP) Separation

Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For A...

Poly-phased Inductively Coupled Plasma Source

METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...

METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD

METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...

SYSTEM AND METHOD FOR TISSUE CONSTRUCTION USING AN ELECTRIC FIELD...

MULTIPLE GAS PLASMA FORMING METHOD AND ICP SOURCE

FLOW PLATE UTILIZATION IN FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION

METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD

PLASMA PROCESSING SYSTEM WITH LOCALLY-EFFICIENT INDUCTIVE PLASMA CO...

CONTROL OF ION ANGULAR DISTRIBUTION FUNCTION AT WAFER SURFACE

PLASMA FLUID MODELING WITH TRANSIENT TO STOCHASTIC TRANSFORMATION

RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING

ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING

PLASMA PROCESSING SYSTEM WITH LOCALLY-EFFICIENT INDUCTIVE PLASMA CO...

EMBEDDED MULTI-INDUCTIVE LARGE AREA PLASMA SOURCE

CONTROL OF ION ANGULAR DISTRIBUTION FUNCTION AT WAFER SURFACE

MULTIFLOW INTEGRATED ICP SOURCE

MULTI-ZONE GAS DISTRIBUTION SYSTEM FOR A TREATMENT SYSTEM

SELECTIVE-REDEPOSITION SOURCES FOR CALIBRATING A PLASMA PROCESS

SELECTIVE-REDEPOSITION STRUCTURES FOR CALIBRATING A PLASMA PROCESS

METHOD AND APPARATUS OF DISTRIBUTED PLASMA PROCESSING SYSTEM FOR CO...

Enhanced reliability deposition baffle for iPVD

METHOD AND SYSTEM FOR DEPOSITING MATERIAL ON A SUBSTRATE USING A SO...

ETCH SYSTEM WITH INTEGRATED INDUCTIVE COUPLING

Hollow body plasma uniformity adjustment device and method

Method and apparatus for monitoring thickness of conductive coating

Segmented biased peripheral electrode in plasma processing method a...

Intelligent system for detection of process status, process fault a...