Ju-hyuck Chung

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor memory devices
- Patent number 8,217,467
- Issue date Jul 10, 2012
- Samsung Electronics Co., Ltd.
- Jong-Sun Sel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-volatile memory devices
- Patent number 7,884,425
- Issue date Feb 8, 2011
- Samsung Electronics Co., Ltd.
- Jong-Sun Sel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor element
- Patent number 7,645,695
- Issue date Jan 12, 2010
- Samsung Electronics Co., Ltd.
- Jun-hwan Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 7,553,761
- Issue date Jun 30, 2009
- Samsung Electronics Co., Ltd.
- Il-Goo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating dual damascene interconnection
- Patent number 7,176,126
- Issue date Feb 13, 2007
- Samsung Electronics, Co., Ltd.
- Hyeok-sang Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inter-metal dielectric patterns and method of forming the same
- Patent number 6,849,536
- Issue date Feb 1, 2005
- Samsung Electronics Co., Ltd.
- Soo-Geun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber used in manufacture of semiconductor device, capabl...
- Patent number 6,797,109
- Issue date Sep 28, 2004
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a semiconductor device having a metal-insu...
- Patent number 6,596,581
- Issue date Jul 22, 2003
- Samsung Electronics Co., Ltd.
- Byung-lyul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber used in manufacture of semiconductor device, capabl...
- Patent number 6,464,794
- Issue date Oct 15, 2002
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming titanium nitride composite layers using composit...
- Patent number 6,291,342
- Issue date Sep 18, 2001
- Samsung Electronics Co., Ltd.
- Jang-eun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming multilayer titanium nitride film by multiple step...
- Patent number 6,207,557
- Issue date Mar 27, 2001
- Samsung Electronics Co., Inc.
- Jang-eun Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICES
- Publication number 20110095377
- Publication date Apr 28, 2011
- Jong-Sun Sel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE MEMORY DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20090127633
- Publication date May 21, 2009
- Samsung Electronics Co., Ltd.
- Jong-Sun SEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device having air gaps
- Publication number 20080124917
- Publication date May 29, 2008
- Samsung Electronics Co., Ltd.
- Jun-Hwan Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method forming metal interconnection filling recessed region using...
- Publication number 20080073787
- Publication date Mar 27, 2008
- Jun-Hwan Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor element
- Publication number 20070232064
- Publication date Oct 4, 2007
- Jun-hwan Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process chamber used in manufacture of semiconductor device, capabl...
- Publication number 20060278341
- Publication date Dec 14, 2006
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20060148264
- Publication date Jul 6, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Il-Goo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Image device and method of fabricating the same
- Publication number 20060049439
- Publication date Mar 9, 2006
- Samsung Electronics Co., Ltd.
- Hyeok-Sang Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming metal interconnect of semiconductor device
- Publication number 20060024941
- Publication date Feb 2, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Jeong-hoon Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating dual damascene interconnection
- Publication number 20060024948
- Publication date Feb 2, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Hyeok-sang Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inter-metal dielectric patterns and method of forming the same
- Publication number 20030186538
- Publication date Oct 2, 2003
- SAMSUNG ELECTRONICS CO., LTD.
- Soo-Geun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing a semiconductor device having a metal-insu...
- Publication number 20030027385
- Publication date Feb 6, 2003
- Byung-lyul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process chamber used in manufacture of semiconductor device, capabl...
- Publication number 20030013315
- Publication date Jan 16, 2003
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process chamber used in manufacture of semiconductor device, capabl...
- Publication number 20030000648
- Publication date Jan 2, 2003
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process chamber used in manufacture of semiconductor device, capabl...
- Publication number 20030000459
- Publication date Jan 2, 2003
- Samsung Electronics Co., Ltd.
- Jeong-hyuck Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of forming titanium nitride composite layers using composit...
- Publication number 20010002334
- Publication date May 31, 2001
- Jang-eun Lee
- H01 - BASIC ELECTRIC ELEMENTS

Ju-hyuck Chung

Person

Patents Grantslast 30 patents

Semiconductor memory devices

Non-volatile memory devices

Method of manufacturing a semiconductor element

Method of fabricating semiconductor device

Method of fabricating dual damascene interconnection

Inter-metal dielectric patterns and method of forming the same

Process chamber used in manufacture of semiconductor device, capabl...

Method for manufacturing a semiconductor device having a metal-insu...

Process chamber used in manufacture of semiconductor device, capabl...

Methods of forming titanium nitride composite layers using composit...

Method of forming multilayer titanium nitride film by multiple step...

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICES

NON-VOLATILE MEMORY DEVICES AND METHODS OF FORMING THE SAME

Method of manufacturing a semiconductor device having air gaps

Method forming metal interconnection filling recessed region using...

Method of manufacturing a semiconductor element

Process chamber used in manufacture of semiconductor device, capabl...

Method of fabricating semiconductor device

Image device and method of fabricating the same

Method of forming metal interconnect of semiconductor device

Method of fabricating dual damascene interconnection

Inter-metal dielectric patterns and method of forming the same

Method for manufacturing a semiconductor device having a metal-insu...

Process chamber used in manufacture of semiconductor device, capabl...

Process chamber used in manufacture of semiconductor device, capabl...

Process chamber used in manufacture of semiconductor device, capabl...

Methods of forming titanium nitride composite layers using composit...