Ju-Wang Hsu

Person

Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,355,642
- Issue date Jun 7, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor and method of forming the same
- Patent number 10,483,397
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor and method of forming the same
- Patent number 8,927,353
- Issue date Jan 6, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate structures
- Patent number 8,030,214
- Issue date Oct 4, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pochi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact hole structures and contact structures and fabrication meth...
- Patent number 7,875,547
- Issue date Jan 25, 2011
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer layer etch method providing enhanced microelectronic device...
- Patent number 7,678,655
- Issue date Mar 16, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung Der Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for a 1T-RAM bit cell and macro
- Patent number 7,425,740
- Issue date Sep 16, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Da Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring low dielectric constant film properties during processing
- Patent number 7,400,401
- Issue date Jul 15, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jang-Shiang Tsai
- G01 - MEASURING TESTING
Information Patent Grant
CMOS devices with improved gap-filling
- Patent number 7,378,308
- Issue date May 27, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternative interconnect structure for semiconductor devices
- Patent number 7,341,935
- Issue date Mar 11, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming high selectivity protection layer on semiconduct...
- Patent number 7,316,970
- Issue date Jan 8, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple gate field effect transistor structure
- Patent number 7,271,448
- Issue date Sep 18, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-level resist structure and fabrication method for contact holes...
- Patent number 7,265,060
- Issue date Sep 4, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of making the same
- Patent number 7,259,050
- Issue date Aug 21, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming contact plug on silicide structure
- Patent number 7,256,137
- Issue date Aug 14, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chii-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistance-reduced semiconductor device and methods for fabricating...
- Patent number 7,256,498
- Issue date Aug 14, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned double gate device and method for forming same
- Patent number 7,230,270
- Issue date Jun 12, 2007
- Taiwan Semiconductor Manfacturing Company, Ltd.
- Hao-Yu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming integrated advanced semiconductor device using s...
- Patent number 7,223,647
- Issue date May 29, 2007
- Taiwan Semiconductor Manufacturing Company
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor with high dielectric constant gate and method for formin...
- Patent number 7,179,701
- Issue date Feb 20, 2007
- Taiwan Semiconductor Manufacturing Company
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively stressing MOSFETs to improve charge carrier...
- Patent number 7,052,946
- Issue date May 30, 2006
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment and etching process for ultra-thin dielectric films
- Patent number 7,008,878
- Issue date Mar 7, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming contact plug on silicide structure
- Patent number 6,884,736
- Issue date Apr 26, 2005
- Taiwan Semiconductor Manufacturing Co, Ltd.
- Chii-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improving sheet resistance of silicide layer after remo...
- Patent number 6,838,381
- Issue date Jan 4, 2005
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Fu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-layer photoresist method for forming high resolution semiconduct...
- Patent number 6,787,455
- Issue date Sep 7, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-level resist structure and fabrication method for contact holes...
- Patent number 6,780,782
- Issue date Aug 24, 2004
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal silicide etch resistant plasma etch method
- Patent number 6,706,640
- Issue date Mar 16, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated approach for controlling top dielectric loss during spac...
- Patent number 6,498,067
- Issue date Dec 24, 2002
- Taiwan Semiconductor Manufacturing Company
- Baw-Ching Perng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20200052122
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME
- Publication number 20150137265
- Publication date May 21, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING GATE STRUCTURES
- Publication number 20110207315
- Publication date Aug 25, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pochi WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FILLED EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME
- Publication number 20080277745
- Publication date Nov 13, 2008
- Taiwan Semiconductor Manufacturing Co., LTD
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLY SILICON HARD MASK
- Publication number 20080122107
- Publication date May 29, 2008
- Taiwan Semiconductor Manufacturing Co., LTD
- Jang-Shiang Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer layer etch method providing enhanced microelectronic device...
- Publication number 20080026518
- Publication date Jan 31, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung Der Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS devices with improved gap-filling
- Publication number 20070235823
- Publication date Oct 11, 2007
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and structure for a 1T-RAM bit cell and macro
- Publication number 20070080387
- Publication date Apr 12, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Da Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measuring low dielectric constant film properties during processing
- Publication number 20060220653
- Publication date Oct 5, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jang-Shiang Tsai
- G01 - MEASURING TESTING
Information Patent Application
Method for selectively stressing MOSFETs to improve charge carrier...
- Publication number 20060223255
- Publication date Oct 5, 2006
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple gate field effect transistor structure
- Publication number 20060180854
- Publication date Aug 17, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY STRESSING MOSFETS TO IMPROVE CHARGE CARRIER...
- Publication number 20060183279
- Publication date Aug 17, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact hole structures and contact structures and fabrication meth...
- Publication number 20060154478
- Publication date Jul 13, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Geometrically optimized spacer to improve device performance
- Publication number 20060148157
- Publication date Jul 6, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hun-Jan Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned double gate device and method for forming same
- Publication number 20060108644
- Publication date May 25, 2006
- Hao-Yu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming integrated advanced semiconductor device using s...
- Publication number 20060099745
- Publication date May 11, 2006
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transistor with high dielectric constant gate and method for formin...
- Publication number 20060063322
- Publication date Mar 23, 2006
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a resist protect layer
- Publication number 20060014396
- Publication date Jan 19, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alternative interconnect structure for semiconductor devices
- Publication number 20050285268
- Publication date Dec 29, 2005
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resistance-reduced semiconductor device and methods for fabricating...
- Publication number 20050258499
- Publication date Nov 24, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of making the same
- Publication number 20050242376
- Publication date Nov 3, 2005
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resistance-reduced semiconductor device and fabrication thereof
- Publication number 20050212058
- Publication date Sep 29, 2005
- Yi-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for selectively stressing MOSFETs to improve charge carrier...
- Publication number 20050199958
- Publication date Sep 15, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming contact plug on silicide structure
- Publication number 20050158986
- Publication date Jul 21, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chii-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment and etching process for ultra-thin dielectric films
- Publication number 20050136680
- Publication date Jun 23, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bi-level resist structure and fabrication method for contact holes...
- Publication number 20040248414
- Publication date Dec 9, 2004
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BI-LEVEL RESIST STRUCTURE AND FABRICATION METHOD FOR CONTACT HOLES...
- Publication number 20040152328
- Publication date Aug 5, 2004
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Ming-Huan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for improving sheet resistance of silicide layer after remo...
- Publication number 20040127026
- Publication date Jul 1, 2004
- Peng-Fu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming contact plug on silicide structure
- Publication number 20040067635
- Publication date Apr 8, 2004
- Chii-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bi-layer photoresist method for forming high resolution semiconduct...
- Publication number 20030119330
- Publication date Jun 26, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Huan Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ju-Wang Hsu

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor structure

Fin field effect transistor and method of forming the same

Fin field effect transistor and method of forming the same

Method of fabricating gate structures

Contact hole structures and contact structures and fabrication meth...

Spacer layer etch method providing enhanced microelectronic device...

Method and structure for a 1T-RAM bit cell and macro

Measuring low dielectric constant film properties during processing

CMOS devices with improved gap-filling

Alternative interconnect structure for semiconductor devices

Method for forming high selectivity protection layer on semiconduct...

Multiple gate field effect transistor structure

Bi-level resist structure and fabrication method for contact holes...

Semiconductor device and method of making the same

Method of forming contact plug on silicide structure

Resistance-reduced semiconductor device and methods for fabricating...

Self-aligned double gate device and method for forming same

Method for forming integrated advanced semiconductor device using s...

Transistor with high dielectric constant gate and method for formin...

Method for selectively stressing MOSFETs to improve charge carrier...

Plasma treatment and etching process for ultra-thin dielectric films

Method of forming contact plug on silicide structure

Methods for improving sheet resistance of silicide layer after remo...

Bi-layer photoresist method for forming high resolution semiconduct...

Bi-level resist structure and fabrication method for contact holes...

Metal silicide etch resistant plasma etch method

Integrated approach for controlling top dielectric loss during spac...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

FIN FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

METHOD OF FABRICATING GATE STRUCTURES

FIN FILLED EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

POLY SILICON HARD MASK

Spacer layer etch method providing enhanced microelectronic device...

CMOS devices with improved gap-filling

Method and structure for a 1T-RAM bit cell and macro

Measuring low dielectric constant film properties during processing

Method for selectively stressing MOSFETs to improve charge carrier...

Multiple gate field effect transistor structure

METHOD FOR SELECTIVELY STRESSING MOSFETS TO IMPROVE CHARGE CARRIER...

Contact hole structures and contact structures and fabrication meth...

Geometrically optimized spacer to improve device performance

Self-aligned double gate device and method for forming same

Method for forming integrated advanced semiconductor device using s...

Transistor with high dielectric constant gate and method for formin...

Method for forming a resist protect layer

Alternative interconnect structure for semiconductor devices

Resistance-reduced semiconductor device and methods for fabricating...

Semiconductor device and method of making the same

Resistance-reduced semiconductor device and fabrication thereof

Method for selectively stressing MOSFETs to improve charge carrier...

Method of forming contact plug on silicide structure

Plasma treatment and etching process for ultra-thin dielectric films

Bi-level resist structure and fabrication method for contact holes...

BI-LEVEL RESIST STRUCTURE AND FABRICATION METHOD FOR CONTACT HOLES...

Methods for improving sheet resistance of silicide layer after remo...

Method of forming contact plug on silicide structure

Bi-layer photoresist method for forming high resolution semiconduct...