Juan Andres Torres Robles

Person

Wilsonville, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Virtual cross metrology-based modeling of semiconductor fabrication...
- Patent number 11,687,066
- Issue date Jun 27, 2023
- SIEMENS INDUSTRY SOFTWARE INC.
- Juan Andres Torres Robles
- G05 - CONTROLLING REGULATING
Information Patent Grant
Hotspot detection based on litho-aware machine learning
- Patent number 11,113,445
- Issue date Sep 7, 2021
- SIEMENS INDUSTRY SOFTWARE INC.
- Jea Woo Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 9,418,195
- Issue date Aug 16, 2016
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 8,843,859
- Issue date Sep 23, 2014
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Analysis optimizer
- Patent number 8,504,959
- Issue date Aug 6, 2013
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model based microdevice design layout correction
- Patent number 8,099,685
- Issue date Jan 17, 2012
- Mentor Graphics Corporation
- Marko P Chew
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Pre-bias optical proximity correction
- Patent number 7,739,650
- Issue date Jun 15, 2010
- Juan Andres Torres Robles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contrast based resolution enhancement for photolithographic processing
- Patent number 7,562,336
- Issue date Jul 14, 2009
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contrast based resolution enhancement for photolithographic processing
- Patent number 7,293,249
- Issue date Nov 6, 2007
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
VIRTUAL CROSS METROLOGY-BASED MODELING OF SEMICONDUCTOR FABRICATION...
- Publication number 20230066516
- Publication date Mar 2, 2023
- Siemens Industry Software Inc.
- Juan Andres Torres Robles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hotspot Detection Based On Litho-Aware Machine Learning
- Publication number 20190087526
- Publication date Mar 21, 2019
- Mentor Graphics Corporation
- Jea Woo Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis For Source Mask Optimization Acceleration
- Publication number 20150067628
- Publication date Mar 5, 2015
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20130036390
- Publication date Feb 7, 2013
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS OPTIMZER
- Publication number 20120144351
- Publication date Jun 7, 2012
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20110047519
- Publication date Feb 24, 2011
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Model Based Hint Generation For Lithographic Friendly Design
- Publication number 20100023916
- Publication date Jan 28, 2010
- Marko P. Chew
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTRAST-BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING
- Publication number 20090271759
- Publication date Oct 29, 2009
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PRE-BIAS OPTICAL PROXIMITY CORRECTION
- Publication number 20090178018
- Publication date Jul 9, 2009
- Juan Andres Torres Robles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Model Based Microdevice Design Layout Correction
- Publication number 20090113359
- Publication date Apr 30, 2009
- Marko P. Chew
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PRE-BIAS OPTICAL PROXIMITY CORRECTION
- Publication number 20080195996
- Publication date Aug 14, 2008
- Juan Andres Torres Robles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYSIS OPTIMIZER
- Publication number 20080141195
- Publication date Jun 12, 2008
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTRAST BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING
- Publication number 20070124708
- Publication date May 31, 2007
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING

Juan Andres Torres Robles

Person

Patents Grantslast 30 patents

Virtual cross metrology-based modeling of semiconductor fabrication...

Hotspot detection based on litho-aware machine learning

Layout content analysis for source mask optimization acceleration

Layout content analysis for source mask optimization acceleration

Analysis optimizer

Model based microdevice design layout correction

Pre-bias optical proximity correction

Contrast based resolution enhancement for photolithographic processing

Contrast based resolution enhancement for photolithographic processing

Patents Applicationslast 30 patents

VIRTUAL CROSS METROLOGY-BASED MODELING OF SEMICONDUCTOR FABRICATION...

Hotspot Detection Based On Litho-Aware Machine Learning

Layout Content Analysis For Source Mask Optimization Acceleration

Layout Content Analysis for Source Mask Optimization Acceleration

ANALYSIS OPTIMZER

Layout Content Analysis for Source Mask Optimization Acceleration

Model Based Hint Generation For Lithographic Friendly Design

CONTRAST-BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING

PRE-BIAS OPTICAL PROXIMITY CORRECTION

Model Based Microdevice Design Layout Correction

PRE-BIAS OPTICAL PROXIMITY CORRECTION

ANALYSIS OPTIMIZER

CONTRAST BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING