Juing-Yi Cheng

Person

Chi-Sau Town, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method of improving short channel effect and gate oxide reliability...
- Patent number 7,087,508
- Issue date Aug 8, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing (CMP) process for shallow trench isol...
- Patent number 7,087,528
- Issue date Aug 8, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming nitrogen enriched gate dielectric with low effect...
- Patent number 6,821,868
- Issue date Nov 23, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry clean process to improve device gate oxide integrity (GOI) and...
- Patent number 6,743,715
- Issue date Jun 1, 2004
- Taiwan Semiconductor Manufacturing Company
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma treating and plasma nitriding gate oxides
- Patent number 6,649,538
- Issue date Nov 18, 2003
- Taiwan Semiconductor Manufacturing Co. Ltd
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing (CMP) process for shallow trench isol...
- Patent number 6,638,866
- Issue date Oct 28, 2003
- Taiwan Semiconductor Manufacturing Company
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lining and corner rounding method for shallow trench isolation
- Patent number 6,541,382
- Issue date Apr 1, 2003
- Taiwan Semiconductor Manufacturing Company
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step chemical mechanical polish (CMP) planarizing method for...
- Patent number 6,391,792
- Issue date May 21, 2002
- Taiwan Semiconductor Manufacturing Co., Ltd
- Syun-Ming Jang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of improving short channel effect and gate oxide reliability...
- Publication number 20050095798
- Publication date May 5, 2005
- Taiwan Semiconductor Manufacturing Co.
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming nitrogen enriched gate dielectric with low effect...
- Publication number 20040126956
- Publication date Jul 1, 2004
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel chemical-mechanical polishing (CMP) process for shallow trenc...
- Publication number 20040048478
- Publication date Mar 11, 2004
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Juing-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Juing-Yi Cheng

Person

Patents Grantslast 30 patents

Method of improving short channel effect and gate oxide reliability...

Chemical-mechanical polishing (CMP) process for shallow trench isol...

Method of forming nitrogen enriched gate dielectric with low effect...

Dry clean process to improve device gate oxide integrity (GOI) and...

Method for plasma treating and plasma nitriding gate oxides

Chemical-mechanical polishing (CMP) process for shallow trench isol...

Lining and corner rounding method for shallow trench isolation

Multi-step chemical mechanical polish (CMP) planarizing method for...

Patents Applicationslast 30 patents

Method of improving short channel effect and gate oxide reliability...

Method of forming nitrogen enriched gate dielectric with low effect...

Novel chemical-mechanical polishing (CMP) process for shallow trenc...