JULIA SVIRCHEVSKI

Person

SAN JOSE, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Single wafer apparatus for drying semiconductor substrates using an...
- Patent number 8,322,045
- Issue date Dec 4, 2012
- Applied Materials, Inc.
- Nathan D. Stein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical dilution system for semiconductor device processing system
- Patent number 7,364,349
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Younes Achkire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for chemical mechanical polishing pad cleaning
- Patent number 7,270,597
- Issue date Sep 18, 2007
- Lam Research Corporation
- Julia S. Svirchevski
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical dilution system for semiconductor device processing system
- Patent number 7,063,455
- Issue date Jun 20, 2006
- Applied Materials
- Younces Achkire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleaning a chemical mechanical polishing pad
- Patent number 6,994,611
- Issue date Feb 7, 2006
- Lam Research Corporation
- Julia S. Svirchevski
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer scrubbing brush core
- Patent number 6,543,084
- Issue date Apr 8, 2003
- Lam Research Corporation
- Tanlin Dickey
- B08 - CLEANING
Information Patent Grant
Method and system of cleaning a wafer after chemical mechanical pol...
- Patent number 6,405,399
- Issue date Jun 18, 2002
- Lam Research Corporation
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleaning a chemical mechanical polishing pad
- Patent number 6,352,595
- Issue date Mar 5, 2002
- Lam Research Corporation
- Julia S. Svirchevski
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer scrubbing brush core
- Patent number 6,240,588
- Issue date Jun 5, 2001
- Lam Research Corporation
- Tanlin Dickey
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...
- Publication number 20090078292
- Publication date Mar 26, 2009
- Applied Materials, Inc.
- Nathan D. Stein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...
- Publication number 20090044839
- Publication date Feb 19, 2009
- Applied Materials, Inc.
- Nathan D. Stein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...
- Publication number 20090032068
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Nathan D. Stein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical dilution system for semiconductor device processing system
- Publication number 20060211344
- Publication date Sep 21, 2006
- APPLIED MATERIALS, INC.
- Younes Achkire
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and system for chemical mechanical polishing pad cleaning
- Publication number 20060040595
- Publication date Feb 23, 2006
- Lam Research Corp.
- Julia S. Svirchevski
- B24 - GRINDING POLISHING
Information Patent Application
Scrubber with integrated vertical marangoni drying
- Publication number 20040200409
- Publication date Oct 14, 2004
- APPLIED MATERIALS, INC.
- Julia Svirchevski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical dilution system for semiconductor device processing system
- Publication number 20040130965
- Publication date Jul 8, 2004
- APPLIED MATERIALS, INC.
- Younes Achkire
- G05 - CONTROLLING REGULATING
Information Patent Application
Single wafer method and apparatus for drying semiconductor substrat...
- Publication number 20040031167
- Publication date Feb 19, 2004
- Nathan D. Stein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems for reducing photo-assisted corrosion in wafers during clea...
- Publication number 20030054730
- Publication date Mar 20, 2003
- Lam Research Corp.
- Helmuth W. Treichel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR REDUCING PHOTO-ASSISTED CORROSION IN WAFERS D...
- Publication number 20020061718
- Publication date May 23, 2002
- TREICHEL
- HELMUTH W. TREICHEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for cleaning a chemical mechanical polishing pad
- Publication number 20020039877
- Publication date Apr 4, 2002
- Julia S. Svirchevski
- B24 - GRINDING POLISHING
Information Patent Application
POST-PLASMA PROCESSING WAFER CLEANING METHOD AND SYSTEM
- Publication number 20020031914
- Publication date Mar 14, 2002
- JULIA S. SVIRCHEVSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RPM MEGASONIC CLEANING
- Publication number 20010047810
- Publication date Dec 6, 2001
- JEFF FARBER
- B08 - CLEANING
Information Patent Application
Wafer scrubbing brush core
- Publication number 20010022008
- Publication date Sep 20, 2001
- Tanlin Dickey
- H01 - BASIC ELECTRIC ELEMENTS

JULIA SVIRCHEVSKI

Person

Patents Grantslast 30 patents

Single wafer apparatus for drying semiconductor substrates using an...

Chemical dilution system for semiconductor device processing system

Method and system for chemical mechanical polishing pad cleaning

Chemical dilution system for semiconductor device processing system

Method and system for cleaning a chemical mechanical polishing pad

Wafer scrubbing brush core

Method and system of cleaning a wafer after chemical mechanical pol...

Method and system for cleaning a chemical mechanical polishing pad

Wafer scrubbing brush core

Patents Applicationslast 30 patents

SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...

SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...

SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRAT...

Chemical dilution system for semiconductor device processing system

Method and system for chemical mechanical polishing pad cleaning

Scrubber with integrated vertical marangoni drying

Chemical dilution system for semiconductor device processing system

Single wafer method and apparatus for drying semiconductor substrat...

Systems for reducing photo-assisted corrosion in wafers during clea...

METHOD AND SYSTEM FOR REDUCING PHOTO-ASSISTED CORROSION IN WAFERS D...

Method and system for cleaning a chemical mechanical polishing pad

POST-PLASMA PROCESSING WAFER CLEANING METHOD AND SYSTEM

HIGH RPM MEGASONIC CLEANING

Wafer scrubbing brush core