Julian KALLER

Person

Koenigsbronn, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical assembly having a thermally conductive component
- Patent number 11,194,119
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Julian Kaller
- G02 - OPTICS
Information Patent Grant
Optical assembly having a thermally conductive component
- Patent number 10,509,336
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Julian Kaller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Optical element unit for exposure processes
- Patent number 10,203,607
- Issue date Feb 12, 2019
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 9,703,098
- Issue date Jul 11, 2017
- Carl Zeiss SMT GmbH
- Guido Soyez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 9,423,695
- Issue date Aug 23, 2016
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Optical element unit for exposure processes having sealing element
- Patent number 9,046,795
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,939,587
- Issue date Jan 27, 2015
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Substrates for mirrors for EUV lithography and their production
- Patent number 8,870,396
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Julian Kaller
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,376,559
- Issue date Feb 19, 2013
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Projection exposure method and projection exposure system therefor
- Patent number 8,248,578
- Issue date Aug 21, 2012
- Carl Zeiss SMT GmbH
- Julian Kaller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,092,029
- Issue date Jan 10, 2012
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Devices and methods for inspecting optical elements with a view to...
- Patent number 7,659,976
- Issue date Feb 9, 2010
- Carl Zeiss SMT AG
- Julian Kaller
- G01 - MEASURING TESTING
Information Patent Grant
Optical element unit for exposure processes
- Patent number 7,545,483
- Issue date Jun 9, 2009
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G02 - OPTICS
Information Patent Grant
Apparatus for scattered light inspection of optical elements
- Patent number 7,443,500
- Issue date Oct 28, 2008
- Carl Zeiss SMT AG
- Julian Kaller
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...
- Publication number 20240319621
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD AND MEASUREMENT METHOD
- Publication number 20230243644
- Publication date Aug 3, 2023
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT
- Publication number 20200103771
- Publication date Apr 2, 2020
- Carl Zeiss SMT GMBH
- Julian Kaller
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20180031827
- Publication date Feb 1, 2018
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT
- Publication number 20170261867
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Julian Kaller
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20160357012
- Publication date Dec 8, 2016
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20150168846
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20150138521
- Publication date May 21, 2015
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20130155509
- Publication date Jun 20, 2013
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION
- Publication number 20130120863
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Julian KALLER
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20120105958
- Publication date May 3, 2012
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
- Publication number 20110058147
- Publication date Mar 10, 2011
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR
- Publication number 20090237636
- Publication date Sep 24, 2009
- Carl Zeiss SMT AG
- Julian KALLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithography projection objective
- Publication number 20090115986
- Publication date May 7, 2009
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20080225247
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
Optical element unit for exposure processes
- Publication number 20080192215
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G02 - OPTICS
Information Patent Application
Lens Module Comprising at Least One Exchangeable Optical Element
- Publication number 20080137192
- Publication date Jun 12, 2008
- Guido Soyez
- G02 - OPTICS
Information Patent Application
Devices and methods for inspecting optical elements with a view to...
- Publication number 20070132989
- Publication date Jun 14, 2007
- Julian Kaller
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for scattered light inspection of optical elements
- Publication number 20050046832
- Publication date Mar 3, 2005
- Carl Zeiss SMT AG
- Julian Kaller
- G01 - MEASURING TESTING

Julian KALLER

Person

Patents Grantslast 30 patents

Optical assembly having a thermally conductive component

Optical assembly having a thermally conductive component

Microlithography projection objective

Optical element unit for exposure processes

Lens module comprising at least one exchangeable optical element

Lens module comprising at least one exchangeable optical element

Microlithography projection objective

Optical element unit for exposure processes having sealing element

Lens module comprising at least one exchangeable optical element

Substrates for mirrors for EUV lithography and their production

Lens module comprising at least one exchangeable optical element

Projection exposure method and projection exposure system therefor

Lens module comprising at least one exchangeable optical element

Devices and methods for inspecting optical elements with a view to...

Optical element unit for exposure processes

Apparatus for scattered light inspection of optical elements

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...

PRODUCTION METHOD AND MEASUREMENT METHOD

OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

MICROLITHOGRAPHY PROJECTION OBJECTIVE

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

MICROLITHOGRAPHY PROJECTION OBJECTIVE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR

Microlithography projection objective

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

Optical element unit for exposure processes

Lens Module Comprising at Least One Exchangeable Optical Element

Devices and methods for inspecting optical elements with a view to...

Apparatus for scattered light inspection of optical elements