Jun Hirose

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system
- Patent number 12,040,202
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ma...
- Patent number 12,040,166
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assembly provided with coolant flow channel, method of controlling...
- Patent number 11,569,073
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Jun Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance device
- Patent number 11,532,467
- Issue date Dec 20, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 11,501,995
- Issue date Nov 15, 2022
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,443,925
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and maintenance apparatus
- Patent number 11,309,168
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma processing device
- Patent number 11,062,881
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Masayuki Sawataishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting flow rate measuring system
- Patent number 10,859,426
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Jun Hirose
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of arranging treatment process
- Patent number 10,845,119
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Jun Hirose
- F26 - DRYING
Information Patent Grant
Plasma processing apparatus and plasma control method
- Patent number 10,840,069
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,361,089
- Issue date Jul 23, 2019
- Tokyo Electron Limited
- Kengo Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 10,020,172
- Issue date Jul 10, 2018
- Tokyo Electron Limited
- Mitsunori Ohata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid control apparatus
- Patent number 9,169,558
- Issue date Oct 27, 2015
- Tokyo Electron Limited
- Jun Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 9,076,636
- Issue date Jul 7, 2015
- Tokyo Electron Limited
- Mitsunori Ohata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, focus ring, and susceptor
- Patent number 8,124,539
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic field generator for magnetron plasma, and plasma etching a...
- Patent number 7,922,865
- Issue date Apr 12, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring and plasma processing apparatus
- Patent number 7,658,816
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,506,610
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Vacuum process system
- Patent number 7,198,448
- Issue date Apr 3, 2007
- Tokyo Electron Limited
- Jun Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum process system
- Patent number 7,025,554
- Issue date Apr 11, 2006
- Tokyo Electron Limited
- Jun Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Patent number 6,848,470
- Issue date Feb 1, 2005
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Patent number 6,820,632
- Issue date Nov 23, 2004
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Vacuum treatment device
- Patent number 6,746,196
- Issue date Jun 8, 2004
- Tokyo Electron Limited
- Jun Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure or construction for mounting a pressure detector
- Patent number 6,606,912
- Issue date Aug 19, 2003
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Grant
Method of detecting abnormalities in flow rate in pressure-type flo...
- Patent number 6,450,190
- Issue date Sep 17, 2002
- Tokyo Electron Ltd.
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20240339306
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240242976
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...
- Publication number 20240096608
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...
- Publication number 20240068921
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20230020793
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS
- Publication number 20220216035
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND PROCESSING METHOD
- Publication number 20220130651
- Publication date Apr 28, 2022
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20220122818
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210407768
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM
- Publication number 20210343559
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBS...
- Publication number 20210257197
- Publication date Aug 19, 2021
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20210005427
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Masayuki SAWATAISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAINTENANCE DEVICE
- Publication number 20200402764
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20200365380
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20200219753
- Publication date Jul 9, 2020
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20190198298
- Publication date Jun 27, 2019
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSEMBLY PROVIDED WITH COOLANT FLOW CHANNEL, METHOD OF CONTROLLING...
- Publication number 20190066985
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INSPECTING FLOW RATE MEASURING SYSTEM
- Publication number 20190063987
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20180350566
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Yasuhiro TOBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180350569
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Kengo KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS
- Publication number 20180233328
- Publication date Aug 16, 2018
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180061619
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ARRANGING TREATMENT PROCESS
- Publication number 20170261258
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20150255255
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Mitsunori Ohata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20120061351
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Mitsunori Ohata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUID CONTROL APPARATUS
- Publication number 20120031500
- Publication date Feb 9, 2012
- Jun Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR
- Publication number 20110000883
- Publication date Jan 6, 2011
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Processing system

Substrate processing apparatus, substrate processing system, and ma...

Assembly provided with coolant flow channel, method of controlling...

Maintenance device

Plasma processing apparatus and mounting table thereof

Substrate support and plasma processing apparatus

Vacuum processing apparatus and maintenance apparatus

Plasma etching method and plasma processing device

Method of inspecting flow rate measuring system

Method of arranging treatment process

Plasma processing apparatus and plasma control method

Plasma processing method

Plasma processing apparatus, plasma processing method and storage m...

Fluid control apparatus

Plasma processing apparatus, plasma processing method and storage m...

Plasma processing method and apparatus

Plasma processing apparatus, focus ring, and susceptor

Magnetic field generator for magnetron plasma, and plasma etching a...

Focus ring and plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method, and electrode plate for pla...

Relative pressure control system and relative flow control system

Vacuum process system

Vacuum process system

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Vacuum treatment device

Structure or construction for mounting a pressure detector

Method of detecting abnormalities in flow rate in pressure-type flo...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...

PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS

PROCESSING SYSTEM AND PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

SUBSTRATE PROCESSING APPARATUS

PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBS...

PLASMA ETCHING METHOD AND PLASMA PROCESSING DEVICE

MAINTENANCE DEVICE

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

ASSEMBLY PROVIDED WITH COOLANT FLOW CHANNEL, METHOD OF CONTROLLING...

METHOD OF INSPECTING FLOW RATE MEASURING SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS

PLASMA PROCESSING APPARATUS

METHOD OF ARRANGING TREATMENT PROCESS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...

FLUID CONTROL APPARATUS

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR

PLASMA PROCESSING METHOD AND APPARATUS