Jun Koshiyama

Person

Fujisawa-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polyimide and/or polyamideimide porous body and method for manufact...
- Patent number 10,576,432
- Issue date Mar 3, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tsukasa Sugawara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for purifying liquid, method for producing chemical solution...
- Patent number 10,576,433
- Issue date Mar 3, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Hayato Takashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing solution for photolithography, method for forming resist...
- Patent number 9,291,905
- Issue date Mar 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Surface treatment liquid, surface treatment method, hydrophobilizat...
- Patent number 9,244,358
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Surface treatment agent and surface treatment method
- Patent number 8,623,131
- Issue date Jan 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for antireflection film formation and method for resist...
- Patent number 8,455,182
- Issue date Jun 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method for a process of liquid immersion lithography
- Patent number 8,409,360
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Surface treatment agent and surface treatment method
- Patent number 8,410,296
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Detergent for lithography and method of forming resist pattern with...
- Patent number 8,367,312
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflection film forming material, and method for forming resis...
- Patent number 8,216,775
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for formation of anti-reflection film, and method for f...
- Patent number 8,158,328
- Issue date Apr 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern, and material for forming coating film
- Patent number 8,124,312
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cleaning liquid for lithography and a cleaning method using it for...
- Patent number 8,058,220
- Issue date Nov 15, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Lithographic rinse solution and method for forming patterned resist...
- Patent number 7,897,325
- Issue date Mar 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid for lithography and cleaning method using same
- Patent number 7,884,062
- Issue date Feb 8, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist pattern forming method and composite rinse agent
- Patent number 7,811,748
- Issue date Oct 12, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for lithography and method for resist pattern forma...
- Patent number 7,795,197
- Issue date Sep 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing fluid for lithography
- Patent number 7,741,260
- Issue date Jun 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid for lithography and method of cleaning therewith
- Patent number 7,576,046
- Issue date Aug 18, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming protective film
- Patent number 7,179,399
- Issue date Feb 20, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Base material for lithography
- Patent number 6,835,530
- Issue date Dec 28, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Protective coating composition for dual damascene process
- Patent number 6,734,258
- Issue date May 11, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Remover solvent for partial removal of photoresist layer
- Patent number 6,117,623
- Issue date Sep 12, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing coating from edge of substrate
- Patent number 6,015,467
- Issue date Jan 18, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Koichi Nagasawa
- B08 - CLEANING
Information Patent Grant
Positive-working quinonediazide photoresist composition containing...
- Patent number 5,518,860
- Issue date May 21, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Niikura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PURIFYING LIQUID, METHOD FOR PRODUCING CHEMICAL SOLUTION...
- Publication number 20180028983
- Publication date Feb 1, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Hayato TAKASHIMA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
POLYIMIDE AND/OR POLYAMIDEIMIDE POROUS BODY AND METHOD FOR MANUFACT...
- Publication number 20180021739
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsukasa SUGAWARA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...
- Publication number 20150160560
- Publication date Jun 11, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THIC...
- Publication number 20120141940
- Publication date Jun 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZAT...
- Publication number 20110195190
- Publication date Aug 11, 2011
- TOKYO OHKA KOGYO CO., LTD.
- Jun Koshiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...
- Publication number 20110159447
- Publication date Jun 30, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
- Publication number 20110118494
- Publication date May 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
- Publication number 20110073011
- Publication date Mar 31, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki YOSHIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cleaning liquid for lithography and a cleaning method using it for...
- Publication number 20110061678
- Publication date Mar 17, 2011
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid and a cleaning method
- Publication number 20110056511
- Publication date Mar 10, 2011
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
- Publication number 20110054184
- Publication date Mar 3, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL
- Publication number 20100255429
- Publication date Oct 7, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...
- Publication number 20100248164
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD OF FORMING...
- Publication number 20100104978
- Publication date Apr 29, 2010
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST...
- Publication number 20100104987
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM
- Publication number 20100035177
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-reflection film forming material, and method for forming resis...
- Publication number 20090253077
- Publication date Oct 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Cleaning Liquid For Lithography and Cleaning Method Using Same
- Publication number 20090029893
- Publication date Jan 29, 2009
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Detergent For Lithography And Method Of Forming Resist Pattern With...
- Publication number 20090004608
- Publication date Jan 1, 2009
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Liquid for Lithography and Method of Cleaning Therewith
- Publication number 20080227678
- Publication date Sep 18, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing Liquid for Lithography and Method for Resist Pattern Forma...
- Publication number 20080193876
- Publication date Aug 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Liquid For Lithography And Method For Resist Pattern Forma...
- Publication number 20080096141
- Publication date Apr 24, 2008
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing Fluid for Lithography
- Publication number 20080026975
- Publication date Jan 31, 2008
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developing Solution Composition for Lithography and Method for Resi...
- Publication number 20070292808
- Publication date Dec 20, 2007
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Pattern Forming Method and Composite Rinse Agent
- Publication number 20070218399
- Publication date Sep 20, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinse Solution For Lithography
- Publication number 20070218412
- Publication date Sep 20, 2007
- TOKYO OHKA KOGYO CO., LTD.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic rinse solution and method for forming patterned resist...
- Publication number 20060128581
- Publication date Jun 15, 2006
- Yoshihiro Sawada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Base material for lithography
- Publication number 20040121260
- Publication date Jun 24, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for forming protective film
- Publication number 20020182360
- Publication date Dec 5, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protective coating composition for dual damascene process
- Publication number 20020077426
- Publication date Jun 20, 2002
- Etsuko Iguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Jun Koshiyama

Person

Patents Grantslast 30 patents

Polyimide and/or polyamideimide porous body and method for manufact...

Method for purifying liquid, method for producing chemical solution...

Developing solution for photolithography, method for forming resist...

Surface treatment liquid, surface treatment method, hydrophobilizat...

Surface treatment agent and surface treatment method

Composition for antireflection film formation and method for resist...

Cleaning method for a process of liquid immersion lithography

Surface treatment agent and surface treatment method

Detergent for lithography and method of forming resist pattern with...

Anti-reflection film forming material, and method for forming resis...

Composition for formation of anti-reflection film, and method for f...

Method for forming pattern, and material for forming coating film

Cleaning liquid for lithography and a cleaning method using it for...

Lithographic rinse solution and method for forming patterned resist...

Cleaning liquid for lithography and cleaning method using same

Resist pattern forming method and composite rinse agent

Cleaning liquid for lithography and method for resist pattern forma...

Rinsing fluid for lithography

Cleaning liquid for lithography and method of cleaning therewith

Material for forming protective film

Base material for lithography

Protective coating composition for dual damascene process

Remover solvent for partial removal of photoresist layer

Method of removing coating from edge of substrate

Positive-working quinonediazide photoresist composition containing...

Patents Applicationslast 30 patents

METHOD FOR PURIFYING LIQUID, METHOD FOR PRODUCING CHEMICAL SOLUTION...

POLYIMIDE AND/OR POLYAMIDEIMIDE POROUS BODY AND METHOD FOR MANUFACT...

DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THIC...

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZAT...

DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...

SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

Cleaning liquid for lithography and a cleaning method using it for...

Cleaning liquid and a cleaning method

SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...

COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD OF FORMING...

COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST...

METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM

Anti-reflection film forming material, and method for forming resis...

Cleaning Liquid For Lithography and Cleaning Method Using Same

Detergent For Lithography And Method Of Forming Resist Pattern With...

Cleaning Liquid for Lithography and Method of Cleaning Therewith

Rinsing Liquid for Lithography and Method for Resist Pattern Forma...

Cleaning Liquid For Lithography And Method For Resist Pattern Forma...

Rinsing Fluid for Lithography

Developing Solution Composition for Lithography and Method for Resi...

Resist Pattern Forming Method and Composite Rinse Agent

Rinse Solution For Lithography

Lithographic rinse solution and method for forming patterned resist...

Base material for lithography

Material for forming protective film

Protective coating composition for dual damascene process