Jun LIN

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching apparatus
- Patent number 11,791,175
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yoshiki Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching device
- Patent number 11,282,714
- Issue date Mar 22, 2022
- Central Glass Company, Limited
- Akifumi Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon-containing film, computer-readable storag...
- Patent number 11,189,498
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,998,199
- Issue date May 4, 2021
- Tokyo Electron Limited
- Susumu Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,734,242
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Kazuaki Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing system
- Patent number 10,734,243
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Tsuhung Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Naturally oxidized film removing method and naturally oxidized film...
- Patent number 10,460,946
- Issue date Oct 29, 2019
- Tokyo Electron Limited
- Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming system
- Patent number 10,199,268
- Issue date Feb 5, 2019
- Tokyo Electron Limited
- Susumu Yamauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching apparatus
- Patent number 9,991,138
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20230395400
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Yoshiki IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20210358772
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Yoshiki IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING DEVICE
- Publication number 20210287915
- Publication date Sep 16, 2021
- Central Glass Company, Limited
- Akifumi YAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190378724
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Satoshi TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON-CONTAINING FILM, COMPUTER-READABLE STORAG...
- Publication number 20190355589
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190304801
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Susumu YAMAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NATURALLY OXIDIZED FILM REMOVING METHOD AND NATURALLY OXIDIZED FILM...
- Publication number 20180211844
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Jun LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180197748
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Kazuaki NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20180166295
- Publication date Jun 14, 2018
- Tsuhung HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20180076087
- Publication date Mar 15, 2018
- Susumu YAMAUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20170032990
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Jun LIN
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Etching method and etching apparatus

Etching method and etching device

Method of etching silicon-containing film, computer-readable storag...

Etching method and etching apparatus

Substrate processing method and substrate processing apparatus

Etching method and substrate processing system

Naturally oxidized film removing method and naturally oxidized film...

Film forming method and film forming system

Etching method and etching apparatus

Patents Applicationslast 30 patents

ETCHING METHOD AND ETCHING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

ETCHING METHOD AND ETCHING DEVICE

ETCHING METHOD AND ETCHING APPARATUS

METHOD OF ETCHING SILICON-CONTAINING FILM, COMPUTER-READABLE STORAG...

ETCHING METHOD AND ETCHING APPARATUS

NATURALLY OXIDIZED FILM REMOVING METHOD AND NATURALLY OXIDIZED FILM...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING METHOD AND FILM FORMING SYSTEM

ETCHING METHOD AND ETCHING APPARATUS