Jun Lu

Person

Beverly, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual XY variable aperture in an ion implantation system
- Patent number 11,574,796
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, system and method for energy spread ion beam
- Patent number 11,569,063
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Paul J. Murphy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 11,114,277
- Issue date Sep 7, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,741,361
- Issue date Aug 11, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,446,372
- Issue date Oct 15, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 9,978,554
- Issue date May 22, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling deflection of a charged particle...
- Patent number 8,129,695
- Issue date Mar 6, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control multiple tilt axes, rotating wafer and variable...
- Patent number 7,166,854
- Issue date Jan 23, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control using multiple fixed wafer orientations and vari...
- Patent number 7,161,161
- Issue date Jan 9, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuously variable aperture for high-energy ion implanter
- Patent number 6,207,964
- Issue date Mar 27, 2001
- Axcelis Technologies, Inc.
- Edward K. McIntyre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for operating a variable aperture in an ion impla...
- Patent number 6,194,734
- Issue date Feb 27, 2001
- Axcelis Technologies, Inc.
- Paul A. Loomis
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLPRO INHIBITORS
- Publication number 20250059159
- Publication date Feb 20, 2025
- SHANGHAI SYNERGY PHARMACEUTICAL SCIENCES CO., LTD
- Jian Wu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM
- Publication number 20240029997
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Paul J. Murphy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual XY Variable Aperture In An Ion Implantation System
- Publication number 20230021619
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM
- Publication number 20220319806
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Paul J. Murphy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20200294765
- Publication date Sep 17, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20190385811
- Publication date Dec 19, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20180211808
- Publication date Jul 26, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CONTROLLING DEFLECTION OF A CHARGED PARTICLE...
- Publication number 20110155921
- Publication date Jun 30, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformity control using multiple tilt axes, rotating wafer and var...
- Publication number 20050263721
- Publication date Dec 1, 2005
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformity control using multiple fixed wafer orientations and vari...
- Publication number 20050258379
- Publication date Nov 24, 2005
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Dual XY variable aperture in an ion implantation system

Apparatus, system and method for energy spread ion beam

Dual cathode ion source

Dual cathode ion source

Dual cathode ion source

Dual cathode ion source

System and method for controlling deflection of a charged particle...

Uniformity control multiple tilt axes, rotating wafer and variable...

Uniformity control using multiple fixed wafer orientations and vari...

Continuously variable aperture for high-energy ion implanter

Method and system for operating a variable aperture in an ion impla...

Patents Applicationslast 30 patents

PLPRO INHIBITORS

APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM

Dual XY Variable Aperture In An Ion Implantation System

APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM

Dual Cathode Ion Source

Dual Cathode Ion Source

Dual Cathode Ion Source

SYSTEM AND METHOD FOR CONTROLLING DEFLECTION OF A CHARGED PARTICLE...

Uniformity control using multiple tilt axes, rotating wafer and var...

Uniformity control using multiple fixed wafer orientations and vari...