Jun NONAKA

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 12,198,948
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Jun Nonaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, mixing method, and substrate proces...
- Patent number 12,068,175
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,033,872
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Keita Hirase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,938,524
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Jun Nonaka
- B08 - CLEANING
Information Patent Grant
Mixing apparatus, mixing method and substrate processing system
- Patent number 11,724,235
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Jun Nonaka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing apparatus and method of processing substrate
- Patent number 11,723,259
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Koukichi Hiroshiro
Information Patent Grant
Control device of substrate processing apparatus and control method...
- Patent number 11,282,727
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, mixing method, and substrate proces...
- Patent number 11,257,692
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,748,790
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Hiroyuki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing method and substrate liquid processing...
- Patent number 10,242,889
- Issue date Mar 26, 2019
- Tokyo Electron Limited
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 10,236,192
- Issue date Mar 19, 2019
- Tokyo Electron Limited
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid treatment apparatus, substrate liquid treatment me...
- Patent number 9,897,919
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Jun Nonaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate liquid processing apparatus and method, and computer-read...
- Patent number 9,862,007
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Daisuke Saiki
- B24 - GRINDING POLISHING
Information Patent Grant
Liquid processing method and liquid processing apparatus
- Patent number 9,412,627
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing method, liquid processing device, and storage medium
- Patent number 8,956,465
- Issue date Feb 17, 2015
- Tokyo Electron Limited
- Jun Nonaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...
- Publication number 20240379388
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230023265
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Jun NONAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230015936
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Yuta HAMASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220168785
- Publication date Jun 2, 2022
- TOKYO ELECTRON LIMITED
- Jun NONAKA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...
- Publication number 20220139734
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20210391539
- Publication date Dec 16, 2021
- TOKYO ELECTRON LIMITED
- Koukichi HIROSHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210366740
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Keita HIRASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STORAGE DEVICE AND STORAGE METHOD
- Publication number 20210368586
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Koji OGURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIXING APPARATUS, MIXING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20200289994
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...
- Publication number 20200294823
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL DEVICE OF SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD...
- Publication number 20200135515
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180254199
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Hiroyuki SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...
- Publication number 20170316961
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Mitsunori Nakamori
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...
- Publication number 20170301534
- Publication date Oct 19, 2017
- TOKYO ELECTRON LIMITED
- Mitsunori Nakamori
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID TREATMENT APPARATUS, SUBSTRATE LIQUID TREATMENT ME...
- Publication number 20170038688
- Publication date Feb 9, 2017
- TOKYO ELECTRON LIMITED
- Jun NONAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE LIQUID PROCESSING...
- Publication number 20160064257
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READ...
- Publication number 20150273538
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Daisuke Saiki
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20150147888
- Publication date May 28, 2015
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20140377463
- Publication date Dec 25, 2014
- Yosuke Hachiya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING DEVICE, AND STORAGE MEDIUM
- Publication number 20140338706
- Publication date Nov 20, 2014
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20130284213
- Publication date Oct 31, 2013
- TOKYO ELECTRON LIMITED
- Yosuke Hachiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD AND LIQUID PROCESSING APPARATUS
- Publication number 20120260952
- Publication date Oct 18, 2012
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Substrate processing apparatus

Substrate processing apparatus, mixing method, and substrate proces...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Mixing apparatus, mixing method and substrate processing system

Substrate processing apparatus and method of processing substrate

Control device of substrate processing apparatus and control method...

Substrate processing apparatus, mixing method, and substrate proces...

Substrate processing apparatus and substrate processing method

Substrate liquid processing method and substrate liquid processing...

Liquid processing apparatus, liquid processing method, and storage...

Substrate liquid treatment apparatus, substrate liquid treatment me...

Substrate liquid processing apparatus and method, and computer-read...

Liquid processing method and liquid processing apparatus

Liquid processing method, liquid processing device, and storage medium

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

STORAGE DEVICE AND STORAGE METHOD

MIXING APPARATUS, MIXING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...

CONTROL DEVICE OF SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...

SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...

SUBSTRATE LIQUID TREATMENT APPARATUS, SUBSTRATE LIQUID TREATMENT ME...

SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE LIQUID PROCESSING...

SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READ...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

LIQUID PROCESSING METHOD, LIQUID PROCESSING DEVICE, AND STORAGE MEDIUM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LIQUID PROCESSING METHOD AND LIQUID PROCESSING APPARATUS