Jun Sonobe

Person

Ibaraki-Pref., JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device and method of cleaning...
- Patent number 9,683,288
- Issue date Jun 20, 2017
- Hitachi Kokusai Electric Inc.
- Kenji Kameda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, subs...
- Patent number 9,540,727
- Issue date Jan 10, 2017
- Hitachi Kokusai Electric, Inc.
- Kenji Kameda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and non-transitory storage medium
- Patent number 9,012,331
- Issue date Apr 21, 2015
- L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Geo...
- Shuji Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 8,679,259
- Issue date Mar 25, 2014
- Hitachi Kokusai Electric Inc.
- Kenji Kameda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low pressure acetylene storage
- Patent number 8,119,853
- Issue date Feb 21, 2012
- L'Air Liquide SociétéAnonyme pour l'Etude et l'Exploitation des Procédés Geor...
- Shih-Wen Huang
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Method of cleaning a film-forming apparatus
- Patent number 7,942,974
- Issue date May 17, 2011
- Kabushiki Kaisha Toshiba
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND NON-TRANSITORY STORAGE MEDIUM
- Publication number 20140357085
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Shuji MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...
- Publication number 20140248783
- Publication date Sep 4, 2014
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Kenji KAMEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...
- Publication number 20140235066
- Publication date Aug 21, 2014
- Hitachi Kokusai Electric Inc.
- Kenji KAMEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING A FILM-FORMING APPARATUS
- Publication number 20130220377
- Publication date Aug 29, 2013
- L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEO...
- Yuusuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20110259370
- Publication date Oct 27, 2011
- Hitachi Kokusai Electric Inc.
- Kenji KAMEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REMOVING RESIDUAL FLUORINE FROM DEPOSITION CHAMBER
- Publication number 20110000508
- Publication date Jan 6, 2011
- L'Air Liquide, Societe Anonyme pour I'Etude et l'Exploitation des Procedes Ge...
- Jun SONOBE
- B08 - CLEANING
Information Patent Application
METHOD OF CLEANING FILM FORMING APPARATUS AND FILM FORMING APPARATUS
- Publication number 20100012153
- Publication date Jan 21, 2010
- Takamitsu Shigemoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW PRESSURE ACETYLENE STORAGE
- Publication number 20090182180
- Publication date Jul 16, 2009
- Shih-Wen Huang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR LOW TEMPERATURE THERMAL CLEANING
- Publication number 20080236482
- Publication date Oct 2, 2008
- Jun SONOBE
- B08 - CLEANING
Information Patent Application
METHOD FOR LOW TEMPERATURE THERMAL CLEANING
- Publication number 20080236483
- Publication date Oct 2, 2008
- Jun SONOBE
- B08 - CLEANING
Information Patent Application
Method of cleaning a film-forming apparatus and film-forming apparatus
- Publication number 20060065289
- Publication date Mar 30, 2006
- Naoki Tamaoki
- B08 - CLEANING
Information Patent Application
Apparatus for the generation and supply of fluorine gas
- Publication number 20050161321
- Publication date Jul 28, 2005
- Colin Kennedy
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of cleaning a film-forming apparatus and film-forming apparatus
- Publication number 20050082002
- Publication date Apr 21, 2005
- Yuusuke Sato
- B08 - CLEANING
Information Patent Application
Method and apparatus for cleaning and method and apparatus for etching
- Publication number 20050020071
- Publication date Jan 27, 2005
- Jun Sonobe
- B08 - CLEANING

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device and method of cleaning...

Cleaning method, method of manufacturing semiconductor device, subs...

Etching method and non-transitory storage medium

Substrate processing apparatus, method of manufacturing semiconduct...

Low pressure acetylene storage

Method of cleaning a film-forming apparatus

Patents Applicationslast 30 patents

ETCHING METHOD AND NON-TRANSITORY STORAGE MEDIUM

CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...

METHOD OF CLEANING A FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF REMOVING RESIDUAL FLUORINE FROM DEPOSITION CHAMBER

METHOD OF CLEANING FILM FORMING APPARATUS AND FILM FORMING APPARATUS

LOW PRESSURE ACETYLENE STORAGE

METHOD FOR LOW TEMPERATURE THERMAL CLEANING

METHOD FOR LOW TEMPERATURE THERMAL CLEANING

Method of cleaning a film-forming apparatus and film-forming apparatus

Apparatus for the generation and supply of fluorine gas

Method of cleaning a film-forming apparatus and film-forming apparatus

Method and apparatus for cleaning and method and apparatus for etching