Jun Tan

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Fin semiconductor device and method for making the same
- Patent number 11,810,965
- Issue date Nov 7, 2023
- Shanghai Huali Integrated Circuit Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin semiconductor device and method for making the same
- Patent number 11,444,182
- Issue date Sep 13, 2022
- Shanghai Huali Integrated Circuit Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,239,364
- Issue date Feb 1, 2022
- Shanghai Huali Integrated Circuit Corporation
- Jun Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SiGe source/drain structure
- Patent number 10,529,857
- Issue date Jan 7, 2020
- Shanghai Huali Microelectronics Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded SiGe epitaxy test pad
- Patent number 10,177,049
- Issue date Jan 8, 2019
- Shanghai Huali Microelectronics Corporation
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SiGe source/drain structure and preparation method thereof
- Patent number 10,134,900
- Issue date Nov 20, 2018
- Shanghai Huali Microelectronics Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded SiGe epitaxy test pad
- Patent number 10,008,420
- Issue date Jun 26, 2018
- Shanghai Huali Microelectronics Corporation
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device and semiconductor device...
- Patent number 9,831,251
- Issue date Nov 28, 2017
- Shanghai Huali Microelectronics Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped cavity for SiGe filling material
- Patent number 9,583,620
- Issue date Feb 28, 2017
- Shanghai Huali Microelectronics Corporation
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for using conformal filling layers to improve d...
- Patent number 9,331,147
- Issue date May 3, 2016
- Shanghai Huali Microelectronics Corporation
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimating clock skew
- Patent number 8,527,925
- Issue date Sep 3, 2013
- International Business Machines Corporation
- Hong Wei Dai
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR CALCULATING CARBON INTENSITIES, TERMINAL A...
- Publication number 20240370787
- Publication date Nov 7, 2024
- ENVISION DIGITAL INTERNATIONAL PTE. LTD.
- Guangyi LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MEASURING THICKNESS OF SILICON EPITAXIAL LAYER
- Publication number 20240282646
- Publication date Aug 22, 2024
- Shanghai Huali Integrated Circuit Corporation
- Jiaqi HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH METHOD FOR FDSOI HYBRID REGION
- Publication number 20240170287
- Publication date May 23, 2024
- Shanghai Huali Integrated Circuit Corporation
- Jiaqi HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SOURCE/DRAIN EPITAXIAL LAYER OF FDSOI MOSFET
- Publication number 20240170344
- Publication date May 23, 2024
- Shanghai Huali Integrated Circuit Corporation
- Jiaqi HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reaction Device for Improving Epitaxial Growth Uniformity
- Publication number 20230332328
- Publication date Oct 19, 2023
- Shanghai Huali Integrated Circuit Corporation
- Hui Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIN SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE SAME
- Publication number 20210376128
- Publication date Dec 2, 2021
- Shanghai Huali Integrated Circuit Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE SAME
- Publication number 20210376131
- Publication date Dec 2, 2021
- Shanghai Huali Integrated Circuit Corporation
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20210036153
- Publication date Feb 4, 2021
- Shanghai Huali Integrated Circuit Corporation
- Jun Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIGE SOURCE/DRAIN STRUCTURE
- Publication number 20180366584
- Publication date Dec 20, 2018
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN OF EMBEDDED SIGE EPITAXY TEST PAD
- Publication number 20180240718
- Publication date Aug 23, 2018
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIGE SOURCE/DRAIN STRUCTURE AND PREPARATION METHOD THEREOF
- Publication number 20180158951
- Publication date Jun 7, 2018
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE...
- Publication number 20170250186
- Publication date Aug 31, 2017
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Qiuming Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPED CAVITY FOR SIGE FILLING MATERIAL
- Publication number 20160308050
- Publication date Oct 20, 2016
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPED CAVITY FOR SIGE FILLING MATERIAL
- Publication number 20160308051
- Publication date Oct 20, 2016
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED SIGE EPITAXY TEST PAD
- Publication number 20160225678
- Publication date Aug 4, 2016
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTIMATING CLOCK SKEW
- Publication number 20130055007
- Publication date Feb 28, 2013
- International Business Machines Corporation
- Hong Wei Dai
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Fin semiconductor device and method for making the same

Fin semiconductor device and method for making the same

Semiconductor device and method for manufacturing the same

SiGe source/drain structure

Embedded SiGe epitaxy test pad

SiGe source/drain structure and preparation method thereof

Embedded SiGe epitaxy test pad

Method of fabricating semiconductor device and semiconductor device...

Shaped cavity for SiGe filling material

Methods and systems for using conformal filling layers to improve d...

Estimating clock skew

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR CALCULATING CARBON INTENSITIES, TERMINAL A...

METHOD FOR MEASURING THICKNESS OF SILICON EPITAXIAL LAYER

EPITAXIAL GROWTH METHOD FOR FDSOI HYBRID REGION

METHOD FOR MANUFACTURING SOURCE/DRAIN EPITAXIAL LAYER OF FDSOI MOSFET

Reaction Device for Improving Epitaxial Growth Uniformity

FIN SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE SAME

FIN SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE SAME

Semiconductor Device and Method for Manufacturing the Same

SIGE SOURCE/DRAIN STRUCTURE

DESIGN OF EMBEDDED SIGE EPITAXY TEST PAD

SIGE SOURCE/DRAIN STRUCTURE AND PREPARATION METHOD THEREOF

METHOD OF FABRICATING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE...

SHAPED CAVITY FOR SIGE FILLING MATERIAL

SHAPED CAVITY FOR SIGE FILLING MATERIAL

EMBEDDED SIGE EPITAXY TEST PAD

ESTIMATING CLOCK SKEW