Jun Wan KIM

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Mask passivation using plasma
- Patent number 9,418,867
- Issue date Aug 16, 2016
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a boron doped carbon hardmask
- Patent number 9,287,124
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK PASSIVATION USING PLASMA
- Publication number 20150200109
- Publication date Jul 16, 2015
- Applied Materials, Inc.
- Byungkook Kong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON...
- Publication number 20150064880
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jun Wan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING A BORON DOPED CARBON HARDMASK
- Publication number 20150064914
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Byungkook KONG
- H01 - BASIC ELECTRIC ELEMENTS