Jun XUE

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High etch selectivity, low stress ashable carbon hard mask
- Patent number 12,062,537
- Issue date Aug 13, 2024
- Lam Research Corporation
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selectively etching for nanowires
- Patent number 11,521,860
- Issue date Dec 6, 2022
- Lam Research Corporation
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,314,168
- Issue date Apr 26, 2022
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Material deposition for high aspect ratio structures
- Patent number 10,276,369
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed plasma for film deposition
- Patent number 10,096,466
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,865,464
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Material deposition for high aspect ratio structures
- Patent number 9,852,902
- Issue date Dec 26, 2017
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Advanced process flow for high quality FCVD films
- Patent number 9,777,378
- Issue date Oct 3, 2017
- Applied Materials, Inc.
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D material modification for advanced processing
- Patent number 9,773,675
- Issue date Sep 26, 2017
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D material modification for advanced processing
- Patent number 9,620,407
- Issue date Apr 11, 2017
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap formation in interconnection structure by implantation process
- Patent number 9,595,467
- Issue date Mar 14, 2017
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process chambers employing distribution grids having focusin...
- Patent number 9,534,289
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bias voltage frequency controlled angular ion distribution in plasm...
- Patent number 9,520,267
- Issue date Dec 13, 2016
- Applied Mateirals, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,502,262
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anisotropic gap etch
- Patent number 9,502,258
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Development of high etch selective hardmask material by ion implant...
- Patent number 9,412,613
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma source based cyclic CVD process for nanocrystalline d...
- Patent number 9,382,625
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halogen-free gas-phase silicon etch
- Patent number 9,190,290
- Issue date Nov 17, 2015
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Systems and methods for collecting and displaying business insights...
- Publication number 20240420057
- Publication date Dec 19, 2024
- ZSCALER, INC.
- Umamaheswaran Arumugam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
- Publication number 20240395542
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
- Publication number 20230230811
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY, MODULUS, AND HARDNESS AMORPHOUS CARBON FILMS AT LOW P...
- Publication number 20220282366
- Publication date Sep 8, 2022
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
- Publication number 20220181147
- Publication date Jun 9, 2022
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20220043334
- Publication date Feb 10, 2022
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20220035247
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210335626
- Publication date Oct 28, 2021
- LAM RESEARCH CORPORATION
- Jun XUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210272814
- Publication date Sep 2, 2021
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL DEPOSITION FOR HIGH ASPECT RATIO STRUCTURES
- Publication number 20180102248
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER ETCHING SYSTEM WITH REMOTE PLASMA SOURCE AND DC ELECTRODE
- Publication number 20170200587
- Publication date Jul 13, 2017
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D MATERIAL MODIFICATION FOR ADVANCED PROCESSING
- Publication number 20170154776
- Publication date Jun 1, 2017
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20170062216
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED PLASMA FOR FILM DEPOSITION
- Publication number 20160276150
- Publication date Sep 22, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED PROCESS FLOW FOR HIGH QUALITY FCVD FILMS
- Publication number 20160194758
- Publication date Jul 7, 2016
- Applied Materials, Inc.
- Srinivas D. NEMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANISOTROPIC GAP ETCH
- Publication number 20160181112
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D MATERIAL MODIFICATION FOR ADVANCED PROCESSING
- Publication number 20160163546
- Publication date Jun 9, 2016
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP FORMATION IN INTERCONNECTION STRUCTURE BY IMPLANTATION PROCESS
- Publication number 20160141202
- Publication date May 19, 2016
- Applied Materials, Inc.
- Jun XUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL DEPOSITION FOR HIGH ASPECT RATIO STRUCTURES
- Publication number 20160099154
- Publication date Apr 7, 2016
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOWABLE FILM PROPERTIES TUNING USING IMPLANTATION
- Publication number 20160079034
- Publication date Mar 17, 2016
- Applied Materials Inc.
- Ellie Y. Yieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING FIN STRUCTURES WITH DESIRED DIMENSIONS FOR 3D S...
- Publication number 20150380526
- Publication date Dec 31, 2015
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS CHAMBERS EMPLOYING DISTRIBUTION GRIDS HAVING FOCUSIN...
- Publication number 20150368801
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIAS VOLTAGE FREQUENCY CONTROLLED ANGULAR ION DISTRIBUTION IN PLASM...
- Publication number 20150371827
- Publication date Dec 24, 2015
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...
- Publication number 20150315707
- Publication date Nov 5, 2015
- Applied Materials, Inc.
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALOGEN-FREE GAS-PHASE SILICON ETCH
- Publication number 20150279687
- Publication date Oct 1, 2015
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...
- Publication number 20150194317
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- PRAMIT MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry Etch Processes
- Publication number 20130115778
- Publication date May 9, 2013
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

High etch selectivity, low stress ashable carbon hard mask

Underlayer for photoresist adhesion and dose reduction

Selectively etching for nanowires

Underlayer for photoresist adhesion and dose reduction

Material deposition for high aspect ratio structures

Pulsed plasma for film deposition

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Material deposition for high aspect ratio structures

Advanced process flow for high quality FCVD films

3D material modification for advanced processing

3D material modification for advanced processing

Air gap formation in interconnection structure by implantation process

Plasma process chambers employing distribution grids having focusin...

Bias voltage frequency controlled angular ion distribution in plasm...

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Anisotropic gap etch

Development of high etch selective hardmask material by ion implant...

Remote plasma source based cyclic CVD process for nanocrystalline d...

Halogen-free gas-phase silicon etch

Patents Applicationslast 30 patents

Systems and methods for collecting and displaying business insights...

HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION

HIGH DENSITY, MODULUS, AND HARDNESS AMORPHOUS CARBON FILMS AT LOW P...

HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

SELECTIVELY ETCHING FOR NANOWIRES

SELECTIVELY ETCHING FOR NANOWIRES

MATERIAL DEPOSITION FOR HIGH ASPECT RATIO STRUCTURES

ATOMIC LAYER ETCHING SYSTEM WITH REMOTE PLASMA SOURCE AND DC ELECTRODE

3D MATERIAL MODIFICATION FOR ADVANCED PROCESSING

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

PULSED PLASMA FOR FILM DEPOSITION

ADVANCED PROCESS FLOW FOR HIGH QUALITY FCVD FILMS

ANISOTROPIC GAP ETCH

3D MATERIAL MODIFICATION FOR ADVANCED PROCESSING

AIR GAP FORMATION IN INTERCONNECTION STRUCTURE BY IMPLANTATION PROCESS

MATERIAL DEPOSITION FOR HIGH ASPECT RATIO STRUCTURES

FLOWABLE FILM PROPERTIES TUNING USING IMPLANTATION

METHODS FOR FORMING FIN STRUCTURES WITH DESIRED DIMENSIONS FOR 3D S...

PLASMA PROCESS CHAMBERS EMPLOYING DISTRIBUTION GRIDS HAVING FOCUSIN...

BIAS VOLTAGE FREQUENCY CONTROLLED ANGULAR ION DISTRIBUTION IN PLASM...

REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...

HALOGEN-FREE GAS-PHASE SILICON ETCH

DEVELOPMENT OF HIGH ETCH SELECTIVE HARDMASK MATERIAL BY ION IMPLANT...

Dry Etch Processes