Jun YAMAWAKU

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing device, and plasma processing method
- Patent number 12,020,900
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Munehito Kagaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,935,727
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus and film-forming method
- Patent number 11,578,407
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,443,920
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,765
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,937,631
- Issue date Mar 2, 2021
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,804,076
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,777,392
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,325,758
- Issue date Jun 18, 2019
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,283,328
- Issue date May 7, 2019
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,211,031
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transfer chamber and method for preventing adhesion of particle
- Patent number 10,115,614
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,997,332
- Issue date Jun 12, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,941,097
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,899,191
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation device, substrate processing device, and film format...
- Patent number 9,583,312
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,502,215
- Issue date Nov 22, 2016
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transfer chamber and method for preventing adhesion of particle
- Patent number 9,385,015
- Issue date Jul 5, 2016
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,349,618
- Issue date May 24, 2016
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,313,872
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,253,867
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 9,236,226
- Issue date Jan 12, 2016
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus, substrate processing apparatus and film...
- Patent number 9,111,747
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of measuring temperature of component in processing chamber...
- Patent number 9,028,139
- Issue date May 12, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- G01 - MEASURING TESTING
Information Patent Grant
Temperature control system including sub-chiller
- Patent number 9,019,505
- Issue date Apr 28, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- G01 - MEASURING TESTING
Information Patent Grant
Substrate removing method and storage medium
- Patent number 8,964,350
- Issue date Feb 24, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring heating method, plasma etching apparatus, and plasma etc...
- Patent number 8,858,753
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,845,853
- Issue date Sep 30, 2014
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring method, storage medium, and program
- Patent number 8,825,434
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
Method for heating part in processing chamber of semiconductor manu...
- Patent number 8,824,875
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Jun Yamawaku
- F27 - FURNACES KILNS OVENS RETORTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240331977
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING DEVICE AND FILM FORMING METHOD
- Publication number 20240229238
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240186122
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- B08 - CLEANING
Information Patent Application
FILM FORMING DEVICE AND FILM FORMING METHOD
- Publication number 20240133031
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20230250530
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230230809
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20220277932
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20220165544
- Publication date May 26, 2022
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING DEVICE AND FILM-FORMING METHOD
- Publication number 20210222296
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200373131
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200357606
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20200312626
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200144026
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200058467
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190221405
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190115188
- Publication date Apr 18, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190108975
- Publication date Apr 11, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180308662
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180218884
- Publication date Aug 2, 2018
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSFER CHAMBER AND METHOD FOR PREVENTING ADHESION OF PARTICLE
- Publication number 20160315001
- Publication date Oct 27, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160203951
- Publication date Jul 14, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160172160
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160126064
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126063
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126065
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118222
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150179407
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150170882
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150132505
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM
- Publication number 20140220260
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jun YAMAWAKU

Person

Patents Grantslast 30 patents

Plasma processing device, and plasma processing method

Substrate processing method

Film-forming apparatus and film-forming method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Transfer chamber and method for preventing adhesion of particle

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Film formation device, substrate processing device, and film format...

Plasma processing apparatus and plasma processing method

Transfer chamber and method for preventing adhesion of particle

Substrate processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Film deposition apparatus, substrate processing apparatus and film...

Method of measuring temperature of component in processing chamber...

Temperature control system including sub-chiller

Substrate removing method and storage medium

Focus ring heating method, plasma etching apparatus, and plasma etc...

Substrate processing apparatus and substrate processing method

Temperature measuring method, storage medium, and program

Method for heating part in processing chamber of semiconductor manu...

Patents Applicationslast 30 patents

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

FILM FORMING DEVICE AND FILM FORMING METHOD

SUBSTRATE PROCESSING APPARATUS

FILM FORMING DEVICE AND FILM FORMING METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

FILM-FORMING DEVICE AND FILM-FORMING METHOD

SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

TRANSFER CHAMBER AND METHOD FOR PREVENTING ADHESION OF PARTICLE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM