Jun Yashiro

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Nirasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Deposit removing method and substrate processing method
- Patent number 8,303,719
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Sungtae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, plasma processing system and storage medium
- Patent number 8,177,990
- Issue date May 15, 2012
- Tokyo Electron Limited
- Ryou Mochizuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process system and method
- Patent number 5,494,522
- Issue date Feb 27, 1996
- Tokyo Electron Limited
- Shuji Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DEPOSIT REMOVING METHOD AND SUBSTRATE PROCESSING METHOD
- Publication number 20090205678
- Publication date Aug 20, 2009
- TOKYO ELECTRON LIMITED
- Sungtae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method, plasma processing system and storage medium
- Publication number 20070284337
- Publication date Dec 13, 2007
- Ryou Mochizuki
- H01 - BASIC ELECTRIC ELEMENTS