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Hwasung-gun, KR
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Patents Grants
last 30 patents
Information
Patent Grant
Resist removing composition and resist removing method using the same
Patent number
6,508,887
Issue date
Jan 21, 2003
Samsung Electronics Co., Ltd.
Dong-jin Park
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Grant
Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, c...
Patent number
6,398,874
Issue date
Jun 4, 2002
Samsung Electronics Co., Ltd.
Dong-jin Park
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of stripping a photoresist from a semiconductor substrate di...
Patent number
6,337,174
Issue date
Jan 8, 2002
Samsung Electronics Co., Ltd.
Mi-sook Jeon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, c...
Patent number
6,274,537
Issue date
Aug 14, 2001
Samsung Electronics Co., Ltd.
Dong-jin Park
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of stripping a photoresist from a semiconductor substrate us...
Patent number
6,207,358
Issue date
Mar 27, 2001
Samsung Electronics Co., Ltd.
Mi-sook Jeon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemical refining method and reuse system for semiconductor device...
Patent number
6,137,018
Issue date
Oct 24, 2000
Samsung Electronics Co., Ltd.
Yong-kyun Ko
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Semiconductor substrate cleaning solutions, methods of forming the...
Patent number
5,846,921
Issue date
Dec 8, 1998
Samsung Electronics Co., Ltd.
June-ing Gil
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Patents Applications
last 30 patents
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Patent Application
Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, c...
Publication number
20010049346
Publication date
Dec 6, 2001
Dong-Jin Park
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY