Junghoon KIM

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,728,139
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,361,941
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Junghoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,004,661
- Issue date May 11, 2021
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma health determination in semiconductor substrate processing r...
- Patent number 10,920,320
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Junghoon Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Magnetic induction plasma source for semiconductor processes and eq...
- Patent number 10,593,560
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching processes
- Patent number 10,424,487
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Jungmin Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy (OES) for remote plasma monitoring
- Patent number 10,319,649
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ spatially resolved plasma monitoring by using optical emiss...
- Patent number 9,874,524
- Issue date Jan 23, 2018
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION
- Publication number 20250037974
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210398778
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Junghoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING
- Publication number 20210217591
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Toan Q. TRAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND PROCESSES FOR PLASMA TUNING
- Publication number 20200090907
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Junghoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF TAILORED VOLTAGE ON BIAS OPERATION
- Publication number 20190311884
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Satoru KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...
- Publication number 20190272999
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
- Publication number 20190259580
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- G01 - MEASURING TESTING
Information Patent Application
ATOMIC LAYER ETCHING PROCESSES
- Publication number 20190122902
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Jungmin Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA HEALTH DETERMINATION IN SEMICONDUCTOR SUBSTRATE PROCESSING R...
- Publication number 20180366378
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Junghoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
- Publication number 20180294198
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SPATIALLY RESOLVED PLASMA MONITORING BY USING OPTICAL EMISS...
- Publication number 20170254755
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Tae Seung CHO
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING
- Publication number 20170069466
- Publication date Mar 9, 2017
- Applied Materials, Inc.
- Toan Q. TRAN
- H01 - BASIC ELECTRIC ELEMENTS

Junghoon KIM

Person

Patents Grantslast 30 patents

Process chamber for cyclic and selective material removal and etching

Methods and apparatus for processing a substrate

Process chamber for cyclic and selective material removal and etching

Plasma health determination in semiconductor substrate processing r...

Magnetic induction plasma source for semiconductor processes and eq...

Atomic layer etching processes

Optical emission spectroscopy (OES) for remote plasma monitoring

In-situ spatially resolved plasma monitoring by using optical emiss...

Patents Applicationslast 30 patents

CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING

SYSTEMS AND PROCESSES FOR PLASMA TUNING

RF TAILORED VOLTAGE ON BIAS OPERATION

MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...

OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING

ATOMIC LAYER ETCHING PROCESSES

PLASMA HEALTH DETERMINATION IN SEMICONDUCTOR SUBSTRATE PROCESSING R...

OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING

IN-SITU SPATIALLY RESOLVED PLASMA MONITORING BY USING OPTICAL EMISS...

PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING