Junichi Iso

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive element, method for formation of resist pattern, and...
- Patent number 8,501,392
- Issue date Aug 6, 2013
- Hitachi Chemical Company, Ltd.
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,460,852
- Issue date Jun 11, 2013
- Hitachi Chemical Company, Ltd.
- Yoshiki Ajioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive element, resist pa...
- Patent number 8,460,853
- Issue date Jun 11, 2013
- Hitachi Chemical Company, Ltd.
- Yoshiki Ajioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIS...
- Publication number 20120040290
- Publication date Feb 16, 2012
- Hitachi Chemical Company, Ltd.
- Yoshiki Ajioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20110111344
- Publication date May 12, 2011
- Hitachi Chemical Company, Ltd.
- Yoshiki Ajioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PA...
- Publication number 20110081616
- Publication date Apr 7, 2011
- Hitachi Chemical Company, Ltd.
- Yoshiki Ajioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...
- Publication number 20090297982
- Publication date Dec 3, 2009
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY