Junichi Kai

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure system and method
- Patent number 6,064,807
- Issue date May 16, 2000
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 6,057,907
- Issue date May 2, 2000
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,866,300
- Issue date Feb 2, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,841,145
- Issue date Nov 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,631,113
- Issue date May 20, 1997
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,610,406
- Issue date Mar 11, 1997
- Fujitsu Limited
- Junichi Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,444,257
- Issue date Aug 22, 1995
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern having optical angle in charged particle...
- Patent number 5,434,795
- Issue date Jul 18, 1995
- Fujitsu Limited
- Junichi Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure method
- Patent number 5,399,872
- Issue date Mar 21, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method and system for exposing a pattern on...
- Patent number 5,369,282
- Issue date Nov 29, 1994
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correction of charged particle beam exposure deflection by detectin...
- Patent number 5,334,846
- Issue date Aug 2, 1994
- Fujitsu Limited
- Mitsuhiro Nakano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,329,130
- Issue date Jul 12, 1994
- Fujitsu Limited
- Junichi Kai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and charged particle beam exp...
- Patent number 5,260,579
- Issue date Nov 9, 1993
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus control system and a metho...
- Patent number 5,225,684
- Issue date Jul 6, 1993
- Fujitsu Limited
- Kazutaka Taki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for making charged particle beam exposure
- Patent number 5,180,920
- Issue date Jan 19, 1993
- Fujitsu Limited
- Junichi Kai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for controlling charged particle beams in char...
- Patent number 5,134,300
- Issue date Jul 28, 1992
- Fujitsu Limited
- Junichi Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system using line beams
- Patent number 4,980,567
- Issue date Dec 25, 1990
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method and apparatus
- Patent number 4,950,910
- Issue date Aug 21, 1990
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for an electron beam exposure system
- Patent number 4,586,141
- Issue date Apr 29, 1986
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY

Junichi Kai

Person

Patents Grantslast 30 patents

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Method and system for exposing an exposure pattern on an object by...

Charged-particle beam exposure system and method

Method of and system for exposing pattern on object by charged part...

Charged particle beam exposure system and method

Method of providing changed particle beam exposure in which represe...

Charged particle beam exposure system

Method of and system for exposing pattern on object by charged part...

Method of and system for exposing pattern on object by charged part...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Electron-beam exposure system for reduced distortion of electron be...

Charged particle beam exposure system and method

Charged particle beam exposure method and apparatus

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Electron-beam exposure system for reduced distortion of electron be...

Method of forming pattern having optical angle in charged particle...

Charged-particle beam exposure method

Electron beam exposure method and system for exposing a pattern on...

Correction of charged particle beam exposure deflection by detectin...

Charged particle beam exposure method and apparatus

Charged particle beam exposure system and charged particle beam exp...

Charged particle beam exposure apparatus control system and a metho...

Method and apparatus for making charged particle beam exposure

Method and apparatus for controlling charged particle beams in char...

Charged particle beam exposure system using line beams

Electron beam exposure method and apparatus

Method and apparatus for an electron beam exposure system

Patents Applicationslast 30 patents

Charged particle beam exposure system and method