Junichi Kon

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Bump-forming material, method for producing electronic component, m...
- Patent number 9,926,422
- Issue date Mar 27, 2018
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including insulating films with different mois...
- Patent number 9,496,222
- Issue date Nov 15, 2016
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method for forming pattern
- Patent number 9,354,517
- Issue date May 31, 2016
- Fujitsu Limited
- Junichi Kon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing compound semiconductor device and detergent
- Patent number 8,940,622
- Issue date Jan 27, 2015
- Fujitsu Limited
- Junichi Kon
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor device, semiconductor device manufacturing method, an...
- Patent number 8,860,211
- Issue date Oct 14, 2014
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and method of cleaning...
- Patent number 8,815,017
- Issue date Aug 26, 2014
- Fujitsu Limited
- Shirou Ozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming resist sensitization film and production metho...
- Patent number 8,795,951
- Issue date Aug 5, 2014
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface coating method, semiconductor device, and circuit board pac...
- Patent number 8,759,161
- Issue date Jun 24, 2014
- Fujitsu Limited
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for forming conductive antireflection film, method for for...
- Patent number 8,557,144
- Issue date Oct 15, 2013
- Fujitsu Limited
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Manufacturing process of semiconductor device
- Patent number 8,349,542
- Issue date Jan 8, 2013
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist composition, resist pattern forming process, and method for...
- Patent number 8,338,072
- Issue date Dec 25, 2012
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern swelling material, and method for patterning using same
- Patent number 8,334,091
- Issue date Dec 18, 2012
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer body, method for forming resist pattern, method for man...
- Patent number 8,313,892
- Issue date Nov 20, 2012
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern and method for manufacturing a se...
- Patent number 8,057,986
- Issue date Nov 15, 2011
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming adhesion reinforcing layer, adhesion reinforci...
- Patent number 7,830,013
- Issue date Nov 9, 2010
- Fujitsu Limited
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,744,768
- Issue date Jun 29, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for forming resist pattern and method for manufacturing a se...
- Patent number 7,723,016
- Issue date May 25, 2010
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material, resist pattern and forming method for the same, an...
- Patent number 7,465,527
- Issue date Dec 16, 2008
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern thickening material, process for forming resist patt...
- Patent number 7,364,829
- Issue date Apr 29, 2008
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern thickness reducing material, resist pattern and proc...
- Patent number 7,338,750
- Issue date Mar 4, 2008
- Fujitsu Limited
- Miwa Kozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof, and gate ele...
- Patent number 7,220,628
- Issue date May 22, 2007
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,189,783
- Issue date Mar 13, 2007
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Chemically amplified resist material and patterning method using same
- Patent number 6,844,135
- Issue date Jan 18, 2005
- Fujitsu Limited
- Junichi Kon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,794,112
- Issue date Sep 21, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,794,113
- Issue date Sep 21, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,787,288
- Issue date Sep 7, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,773,867
- Issue date Aug 10, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,506,534
- Issue date Jan 14, 2003
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 6,465,137
- Issue date Oct 15, 2002
- Fujitsu Limited
- Keiji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BUMP-FORMING MATERIAL, METHOD FOR PRODUCING ELECTRONIC COMPONENT, M...
- Publication number 20170260348
- Publication date Sep 14, 2017
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20140272706
- Publication date Sep 18, 2014
- Fujitsu Limited
- Junichi Kon
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE FABRICATION METHOD
- Publication number 20140264826
- Publication date Sep 18, 2014
- Fujitsu Limited
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSING AGENT FOR LITHOGRAPHY, METHOD FOR FORMING A RESIST PATTERN,...
- Publication number 20140057437
- Publication date Feb 27, 2014
- Miwa KOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...
- Publication number 20130306102
- Publication date Nov 21, 2013
- Fujitsu Limited
- Shirou OZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AN...
- Publication number 20130154082
- Publication date Jun 20, 2013
- Fujitsu Limited
- Junichi KON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...
- Publication number 20120220105
- Publication date Aug 30, 2012
- Fujitsu Limited
- Shirou OZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR DEVICE AND DETERGENT
- Publication number 20120214294
- Publication date Aug 23, 2012
- Fujitsu Limited
- Junichi KON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE COATING METHOD, SEMICONDUCTOR DEVICE, AND CIRCUIT BOARD PAC...
- Publication number 20120184071
- Publication date Jul 19, 2012
- FUJITSU LIMITED
- Junichi KON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHO...
- Publication number 20110081615
- Publication date Apr 7, 2011
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE
- Publication number 20100227278
- Publication date Sep 9, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING A SE...
- Publication number 20100193841
- Publication date Aug 5, 2010
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FOR...
- Publication number 20100009296
- Publication date Jan 14, 2010
- Fujitsu Limited
- Junichi Kon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming resist pattern and method for manufacturing a se...
- Publication number 20090081593
- Publication date Mar 26, 2009
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern swelling material, and method for patterning using same
- Publication number 20080274431
- Publication date Nov 6, 2008
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing a magnetic recording head
- Publication number 20080213501
- Publication date Sep 4, 2008
- Fujitsu Limited
- Kazuaki Inukai
- G11 - INFORMATION STORAGE
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND METHOD FOR...
- Publication number 20080076252
- Publication date Mar 27, 2008
- Fujitsu Limited
- Junichi KON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for forming adhesion reinforcing layer, adhesion reinforci...
- Publication number 20070111539
- Publication date May 17, 2007
- FUJITSU LIMITED
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Resist pattern thickening material, resist pattern and forming proc...
- Publication number 20070106021
- Publication date May 10, 2007
- FUJITSU LIMITED
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Semiconductor device and manufacturing method thereof, and gate ele...
- Publication number 20060046446
- Publication date Mar 2, 2006
- FUJITSU LIMITED
- Junichi Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer body, method for forming resist pattern, method for man...
- Publication number 20050277055
- Publication date Dec 15, 2005
- FUJITSU LIMITED
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material, process for forming resist patt...
- Publication number 20040121259
- Publication date Jun 24, 2004
- FUJIITSU LIMITED
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Chemically amplified resist material and patterning method using same
- Publication number 20040013975
- Publication date Jan 22, 2004
- FUJITSU LIMITED
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern swelling material, and method for patterning using same
- Publication number 20030175624
- Publication date Sep 18, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material, resist pattern and forming proc...
- Publication number 20030157801
- Publication date Aug 21, 2003
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Resist pattern thickness reducing material, resist pattern and proc...
- Publication number 20030143490
- Publication date Jul 31, 2003
- FUJITSU LIMITED
- Miwa Kozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030143482
- Publication date Jul 31, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138726
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138724
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138725
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Junichi Kon

Person

Patents Grantslast 30 patents

Bump-forming material, method for producing electronic component, m...

Semiconductor device including insulating films with different mois...

Resist composition and method for forming pattern

Method for manufacturing compound semiconductor device and detergent

Semiconductor device, semiconductor device manufacturing method, an...

Method of manufacturing semiconductor device and method of cleaning...

Material for forming resist sensitization film and production metho...

Surface coating method, semiconductor device, and circuit board pac...

Material for forming conductive antireflection film, method for for...

Manufacturing process of semiconductor device

Resist composition, resist pattern forming process, and method for...

Resist pattern swelling material, and method for patterning using same

Multi-layer body, method for forming resist pattern, method for man...

Method for forming resist pattern and method for manufacturing a se...

Material for forming adhesion reinforcing layer, adhesion reinforci...

Resist pattern thickening material, resist pattern and forming proc...

Method for forming resist pattern and method for manufacturing a se...

Resist material, resist pattern and forming method for the same, an...

Resist pattern thickening material, process for forming resist patt...

Resist pattern thickness reducing material, resist pattern and proc...

Semiconductor device and manufacturing method thereof, and gate ele...

Resist pattern thickening material, resist pattern and forming proc...

Chemically amplified resist material and patterning method using same

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Resist composition and pattern forming process

Patents Applicationslast 30 patents

BUMP-FORMING MATERIAL, METHOD FOR PRODUCING ELECTRONIC COMPONENT, M...

RESIST COMPOSITION AND METHOD FOR FORMING PATTERN

SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE FABRICATION METHOD

RINSING AGENT FOR LITHOGRAPHY, METHOD FOR FORMING A RESIST PATTERN,...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...

SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AN...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING...

METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR DEVICE AND DETERGENT

SURFACE COATING METHOD, SEMICONDUCTOR DEVICE, AND CIRCUIT BOARD PAC...

MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHO...

MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE

METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING A SE...

MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FOR...

Method for forming resist pattern and method for manufacturing a se...

Resist pattern swelling material, and method for patterning using same

Method of manufacturing a magnetic recording head

RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND METHOD FOR...

Material for forming adhesion reinforcing layer, adhesion reinforci...

Resist pattern thickening material, resist pattern and forming proc...

Semiconductor device and manufacturing method thereof, and gate ele...

Multi-layer body, method for forming resist pattern, method for man...

Resist pattern thickening material, process for forming resist patt...

Chemically amplified resist material and patterning method using same

Resist pattern swelling material, and method for patterning using same

Resist pattern thickening material, resist pattern and forming proc...

Resist pattern thickness reducing material, resist pattern and proc...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...