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Junichi Miyakawa
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
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Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,829,068
Issue date
Nov 28, 2023
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,644,751
Issue date
May 9, 2023
Tokyo Ohka Kogyo Co., Ltd.
Junichi Miyakawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method of forming resist pattern, and compound
Patent number
11,635,686
Issue date
Apr 25, 2023
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,635,687
Issue date
Apr 25, 2023
TOKYO OHKA KOGYO, CO., LTD.
Junichi Miyakawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method of forming resist pattern, and compound
Patent number
11,460,770
Issue date
Oct 4, 2022
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
Publication number
20240295812
Publication date
Sep 5, 2024
Tokyo Ohka Kogyo Co., Ltd.
Junichi Miyakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
Publication number
20240264527
Publication date
Aug 8, 2024
Tokyo Ohka Kogyo Co., Ltd.
Takuya Uehara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240248403
Publication date
Jul 25, 2024
Tokyo Ohka Kogyo Co., Ltd.
Tetsuya Matsushita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220121117
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210181634
Publication date
Jun 17, 2021
Tokyo Ohka Kogyo Co., Ltd.
Junichi MIYAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210181633
Publication date
Jun 17, 2021
Tokyo Ohka Kogyo Co., Ltd.
Junichi MIYAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
Publication number
20200174365
Publication date
Jun 4, 2020
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
Publication number
20200174366
Publication date
Jun 4, 2020
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY