Junichi Sasaki

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of cleaning stage in plasma processing apparatus, and the pl...
- Patent number 12,090,529
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Takamitsu Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,171
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning stage in plasma processing apparatus, and the pl...
- Patent number 11,865,591
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takamitsu Takayama
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus, processing method, and upper electrode...
- Patent number 11,488,807
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Kota Shihommatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,500
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dechuck control method and plasma processing apparatus
- Patent number 11,037,815
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fixing device and image forming apparatus incorporating same
- Patent number 10,990,060
- Issue date Apr 27, 2021
- Ricoh Company, Ltd.
- Atsushi Ashikagaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,847,348
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
De-chuck control method and plasma processing apparatus
- Patent number 9,966,291
- Issue date May 8, 2018
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,330,891
- Issue date May 3, 2016
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charging device, image forming apparatus, and computer program product
- Patent number 9,122,187
- Issue date Sep 1, 2015
- Ricoh Company, Limited
- Junichi Sasaki
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Charging device, image forming apparatus, and computer program product
- Patent number 9,104,129
- Issue date Aug 11, 2015
- Ricoh Company, Limited
- Junichi Sasaki
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING METHOD
- Publication number 20240087858
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PSEUDO-STATIC RANDOM-ACCESS MEMORY AND READING METHOD THEREOF
- Publication number 20230352083
- Publication date Nov 2, 2023
- WINBOND ELECTRONICS CORP.
- Junichi Sasaki
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD OF CLEANING STAGE IN PLASMA PROCESSING APPARATUS, AND THE PL...
- Publication number 20230173558
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220336193
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220157573
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING STAGE IN PLASMA PROCESSING APPARATUS, AND THE PL...
- Publication number 20210162468
- Publication date Jun 3, 2021
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210118647
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PROCESSING METHOD, AND UPPER ELECTRODE...
- Publication number 20210074520
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIXING DEVICE AND IMAGE FORMING APPARATUS INCORPORATING SAME
- Publication number 20200272091
- Publication date Aug 27, 2020
- Ricoh Company, Ltd.
- Atsushi ASHIKAGAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200176226
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200144090
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190074209
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DE-CHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150194330
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150114930
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Ryo NONAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD OF PLASMA PROCESSING APPARATUS AND STORAGE MEDIUM
- Publication number 20100218786
- Publication date Sep 2, 2010
- TOKYO ELECTRON LIMITED
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS

Junichi Sasaki

Person

Patents Grantslast 30 patents

Method of cleaning stage in plasma processing apparatus, and the pl...

Plasma processing apparatus and plasma processing method

Method of cleaning stage in plasma processing apparatus, and the pl...

Plasma processing apparatus, processing method, and upper electrode...

Plasma processing apparatus and plasma processing method

Dechuck control method and plasma processing apparatus

Fixing device and image forming apparatus incorporating same

Plasma processing apparatus and plasma processing method

De-chuck control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Charging device, image forming apparatus, and computer program product

Charging device, image forming apparatus, and computer program product

Patents Applicationslast 30 patents

CLEANING METHOD AND PLASMA PROCESSING METHOD

PSEUDO-STATIC RANDOM-ACCESS MEMORY AND READING METHOD THEREOF

METHOD OF CLEANING STAGE IN PLASMA PROCESSING APPARATUS, AND THE PL...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

EDGE RING AND SUBSTRATE PROCESSING APPARATUS

METHOD OF CLEANING STAGE IN PLASMA PROCESSING APPARATUS, AND THE PL...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, PROCESSING METHOD, AND UPPER ELECTRODE...

FIXING DEVICE AND IMAGE FORMING APPARATUS INCORPORATING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

DECHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS

DE-CHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CLEANING METHOD OF PLASMA PROCESSING APPARATUS AND STORAGE MEDIUM