Junichi Shiozawa

Person

Yokkaichi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having an oxide film formed on a semiconductor...
- Patent number 8,728,903
- Issue date May 20, 2014
- Kabushiki Kaisha Toshiba
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,404,537
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Isao Kamioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an oxide film formed on a semiconductor...
- Patent number 8,258,568
- Issue date Sep 4, 2012
- Kabushiki Kaisha Toshiba
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,097,503
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Isao Kamioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of manufacturing the same
- Patent number 7,927,949
- Issue date Apr 19, 2011
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an oxide film formed on a semiconductor...
- Patent number 7,928,530
- Issue date Apr 19, 2011
- Kabushiki Kaisha Toshiba
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,858,467
- Issue date Dec 28, 2010
- Kabushiki Kaisha Toshiba
- Isao Kamioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of manufacturing the same
- Patent number 7,723,772
- Issue date May 25, 2010
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,679,127
- Issue date Mar 16, 2010
- Kabushiki Kaisha Toshiba
- Junichi Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an oxide film formed on a semiconductor...
- Patent number 7,645,674
- Issue date Jan 12, 2010
- Kabushiki Kaisha Toshiba
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an oxide film formed on a semiconductor...
- Patent number 7,315,073
- Issue date Jan 1, 2008
- Kabushiki Kaisha Toshiba
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,803,622
- Issue date Oct 12, 2004
- Kabushiki Kaisha Toshiba
- Koichi Matsuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming boron doped silicon layer and semiconductor
- Patent number 5,389,570
- Issue date Feb 14, 1995
- Kabushiki Kaisha Toshiba
- Junichi Shiozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...
- Publication number 20120302035
- Publication date Nov 29, 2012
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120282773
- Publication date Nov 8, 2012
- Kabushiki Kaisha Toshiba
- Isao Kamioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120122294
- Publication date May 17, 2012
- Kabushiki Kaisha Toshiba
- Isao Kamioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...
- Publication number 20110156126
- Publication date Jun 30, 2011
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20110065262
- Publication date Mar 17, 2011
- Isao KAMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20100197130
- Publication date Aug 5, 2010
- Kabushiki Kaisha Toshiba
- Yoshio OZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...
- Publication number 20100081250
- Publication date Apr 1, 2010
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090246932
- Publication date Oct 1, 2009
- Isao KAMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080121972
- Publication date May 29, 2008
- Kabushiki Kaisha Toshiba
- Junichi Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...
- Publication number 20070281428
- Publication date Dec 6, 2007
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory device and method of manufacturing the same
- Publication number 20070196985
- Publication date Aug 23, 2007
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20060243978
- Publication date Nov 2, 2006
- Kabushiki Kaisha Toshiba
- Mikio Wakamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory device and method of manufacturing the same
- Publication number 20060240619
- Publication date Oct 26, 2006
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having an oxide film formed on a semiconductor...
- Publication number 20060157817
- Publication date Jul 20, 2006
- Toshitake Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050029576
- Publication date Feb 10, 2005
- Kabushiki Kaisha Toshiba
- Koichi Matsuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040036107
- Publication date Feb 26, 2004
- Kabushiki Kaisha Toshiba
- Koichi Matsuno
- H01 - BASIC ELECTRIC ELEMENTS

Junichi Shiozawa

Person

Patents Grantslast 30 patents

Semiconductor device having an oxide film formed on a semiconductor...

Method of manufacturing semiconductor device

Semiconductor device having an oxide film formed on a semiconductor...

Method of manufacturing semiconductor device

Semiconductor memory device and method of manufacturing the same

Semiconductor device having an oxide film formed on a semiconductor...

Method of manufacturing semiconductor device

Semiconductor memory device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device having an oxide film formed on a semiconductor...

Semiconductor device having an oxide film formed on a semiconductor...

Semiconductor device and method of manufacturing the same

Method of forming boron doped silicon layer and semiconductor

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...

Method of manufacturing semiconductor device

SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE HAVING AN OXIDE FILM FORMED ON A SEMICONDUCTOR...

Semiconductor memory device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor memory device and method of manufacturing the same

Semiconductor device having an oxide film formed on a semiconductor...

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same