Junichi Tashiro

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron microscope and specimen analyzing method
- Patent number 8,664,598
- Issue date Mar 4, 2014
- SII NanoTechnology Inc.
- Masakatsu Hasuda
- G01 - MEASURING TESTING
Information Patent Grant
Particle removing method, particle removing device, atomic force mi...
- Patent number 8,657,962
- Issue date Feb 25, 2014
- AOI Electronics Co., Ltd.
- Hiroki Hayashi
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Focused ion beam system and sample processing method using the same
- Patent number 8,581,206
- Issue date Nov 12, 2013
- SII NanoTechnology Inc.
- Xin Man
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for cross-section processing and observation
- Patent number 8,542,275
- Issue date Sep 24, 2013
- SII NanoTechnology Inc.
- Masahiro Kiyohara
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam apparatus, sample processing method using the same...
- Patent number 8,426,830
- Issue date Apr 23, 2013
- Sll Nano Technology Inc.
- Makoto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Section processing method and its apparatus
- Patent number 8,306,264
- Issue date Nov 6, 2012
- SII NanoTechnology Inc.
- Toshiaki Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite focused ion beam device, process observation method using...
- Patent number 8,274,063
- Issue date Sep 25, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
Sample processing and observing method
- Patent number 8,274,049
- Issue date Sep 25, 2012
- SII NanoTechnology Inc.
- Keiichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite focused ion beam device, and processing observation metho...
- Patent number 8,269,194
- Issue date Sep 18, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
Sample preparing device and sample posture shifting method
- Patent number 8,198,603
- Issue date Jun 12, 2012
- SII NanoTechnology Inc.
- Haruo Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring length of measurement object article in micro-s...
- Patent number 7,923,267
- Issue date Apr 12, 2011
- SII NanoTechnology Inc.
- Masanao Munekane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample relocation method in charged particle beam apparatus and cha...
- Patent number 7,872,231
- Issue date Jan 18, 2011
- Sll NanoTechnology Inc.
- Junichi Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for working and observing samples and method of working a...
- Patent number 7,755,044
- Issue date Jul 13, 2010
- Sii Nano Technology Inc.
- Toshiaki Fujii
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for specifying working position on a sample an...
- Patent number 7,595,488
- Issue date Sep 29, 2009
- SII Nano Technology Inc.
- Junichi Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and sample section forming and thin-piec...
- Patent number 7,531,796
- Issue date May 12, 2009
- SII NanoTechnology Inc.
- Junichi Tashiro
- G01 - MEASURING TESTING
Information Patent Grant
Sample height regulating method, sample observing method, sample pr...
- Patent number 7,423,266
- Issue date Sep 9, 2008
- SII NanoTechnology Inc.
- Junichi Tashiro
- G01 - MEASURING TESTING
Information Patent Grant
Photomask correction method using composite charged particle beam,...
- Patent number 7,172,839
- Issue date Feb 6, 2007
- SII NanoTechnology Inc.
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Sample processing and observing method
- Publication number 20110226948
- Publication date Sep 22, 2011
- Keiichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron microscope and specimen analyzing method
- Publication number 20110186734
- Publication date Aug 4, 2011
- Masakatsu Hasuda
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION
- Publication number 20110063431
- Publication date Mar 17, 2011
- Masahiro KIYOHARA
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION
- Publication number 20110052044
- Publication date Mar 3, 2011
- Haruo Takahashi
- G01 - MEASURING TESTING
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...
- Publication number 20100288924
- Publication date Nov 18, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME
- Publication number 20100213386
- Publication date Aug 26, 2010
- Xin Man
- G01 - MEASURING TESTING
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...
- Publication number 20100176296
- Publication date Jul 15, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME...
- Publication number 20100155624
- Publication date Jun 24, 2010
- Makoto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Section processing method and its apparatus
- Publication number 20100008563
- Publication date Jan 14, 2010
- Toshiaki Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect recognizing method, defect observing method, and charged par...
- Publication number 20090134327
- Publication date May 28, 2009
- Yutaka Ikku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample preparing device and sample posture shifting method
- Publication number 20090114842
- Publication date May 7, 2009
- Haruo Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle removing method, particle removing device, atomic force mi...
- Publication number 20080307866
- Publication date Dec 18, 2008
- AOI ELECTRONICS CO., LTD.
- Hayashi Hiroki
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
SAMPLE RELOCATION METHOD IN CHARGED PARTICLE BEAM APPARATUS AND CHA...
- Publication number 20080302961
- Publication date Dec 11, 2008
- Junichi Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR WORKING AND OBSERVING SAMPLES AND METHOD OF WORKING A...
- Publication number 20080224198
- Publication date Sep 18, 2008
- Toshiaki Fujii
- G01 - MEASURING TESTING
Information Patent Application
Method of Correcting Photomask Defect
- Publication number 20080131792
- Publication date Jun 5, 2008
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Correcting Photomask Defect
- Publication number 20080107975
- Publication date May 8, 2008
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUSED ION BEAM APPARATUS AND SAMPLE SECTION FORMING AND THIN-PIEC...
- Publication number 20080042059
- Publication date Feb 21, 2008
- Junichi Tashiro
- G01 - MEASURING TESTING
Information Patent Application
Photomask correction method using composite charged particle beam,...
- Publication number 20070267579
- Publication date Nov 22, 2007
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate, micro structure, method of making reference scale, and m...
- Publication number 20060216838
- Publication date Sep 28, 2006
- Masanao Munekane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample height regulating method, sample observing method, sample pr...
- Publication number 20060192118
- Publication date Aug 31, 2006
- Junichi Tashiro
- G01 - MEASURING TESTING
Information Patent Application
Method for specifying observing or working position and apparatus t...
- Publication number 20060138341
- Publication date Jun 29, 2006
- Junichi Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask correction method using composite charged particle beam,...
- Publication number 20040131953
- Publication date Jul 8, 2004
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Junichi Tashiro

Person

Patents Grantslast 30 patents

Electron microscope and specimen analyzing method

Particle removing method, particle removing device, atomic force mi...

Focused ion beam system and sample processing method using the same

Method and apparatus for cross-section processing and observation

Focused ion beam apparatus, sample processing method using the same...

Section processing method and its apparatus

Composite focused ion beam device, process observation method using...

Sample processing and observing method

Composite focused ion beam device, and processing observation metho...

Sample preparing device and sample posture shifting method

Method of measuring length of measurement object article in micro-s...

Sample relocation method in charged particle beam apparatus and cha...

Apparatus for working and observing samples and method of working a...

Method and apparatus for specifying working position on a sample an...

Focused ion beam apparatus and sample section forming and thin-piec...

Sample height regulating method, sample observing method, sample pr...

Photomask correction method using composite charged particle beam,...

Patents Applicationslast 30 patents

Sample processing and observing method

Electron microscope and specimen analyzing method

METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION

METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION

COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...

FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME

COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...

FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME...

Section processing method and its apparatus

Defect recognizing method, defect observing method, and charged par...

Sample preparing device and sample posture shifting method

Particle removing method, particle removing device, atomic force mi...

SAMPLE RELOCATION METHOD IN CHARGED PARTICLE BEAM APPARATUS AND CHA...

APPARATUS FOR WORKING AND OBSERVING SAMPLES AND METHOD OF WORKING A...

Method of Correcting Photomask Defect

Method of Correcting Photomask Defect

FOCUSED ION BEAM APPARATUS AND SAMPLE SECTION FORMING AND THIN-PIEC...

Photomask correction method using composite charged particle beam,...

Substrate, micro structure, method of making reference scale, and m...

Sample height regulating method, sample observing method, sample pr...

Method for specifying observing or working position and apparatus t...

Photomask correction method using composite charged particle beam,...