Junichi Tsuchiya

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hard mask-forming composition and method for manufacturing electron...
- Patent number 11,921,425
- Issue date Mar 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hard mask-forming composition and method for manufacturing electron...
- Patent number 11,650,503
- Issue date May 16, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,921,711
- Issue date Feb 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi Fujisaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,627,717
- Issue date Apr 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of recovering resist pattern
- Patent number 10,429,740
- Issue date Oct 1, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,846,364
- Issue date Dec 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,696,625
- Issue date Jul 4, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing polymeric compound, resist composition and meth...
- Patent number 9,469,712
- Issue date Oct 18, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,411,227
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for forming resist pattern and resist composition
- Patent number 9,405,190
- Issue date Aug 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,274,424
- Issue date Mar 1, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern
- Patent number 9,244,357
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yuta Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 9,140,983
- Issue date Sep 22, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,927,191
- Issue date Jan 6, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,911,928
- Issue date Dec 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Surface modifying material, method of forming resist pattern, and m...
- Patent number 8,735,052
- Issue date May 27, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Isao Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 8,658,343
- Issue date Feb 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,609,320
- Issue date Dec 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,323,869
- Issue date Dec 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,227,170
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...
- Publication number 20250215207
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Shota Iino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...
- Publication number 20250215206
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE
- Publication number 20250147413
- Publication date May 8, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Ken MIYAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD...
- Publication number 20240425694
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERCOAT AGENT, AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE...
- Publication number 20240191096
- Publication date Jun 13, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20230221643
- Publication date Jul 13, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20210382392
- Publication date Dec 9, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20210132498
- Publication date May 6, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20200209741
- Publication date Jul 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20200041904
- Publication date Feb 6, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200004142
- Publication date Jan 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200004143
- Publication date Jan 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284611
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi FUJISAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284612
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20160349617
- Publication date Dec 1, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF RECOVERING RESIST PATTERN
- Publication number 20160274464
- Publication date Sep 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20160266495
- Publication date Sep 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20150198881
- Publication date Jul 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20150118616
- Publication date Apr 30, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20140363772
- Publication date Dec 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20140287362
- Publication date Sep 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...
- Publication number 20140272727
- Publication date Sep 18, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20140205956
- Publication date Jul 24, 2014
- Tokyo Ohka Kogyo Co., Ltd
- Yuta Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120308928
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120183900
- Publication date Jul 19, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition, and method of forming resist pattern
- Publication number 20120148953
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120135347
- Publication date May 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE MODIFYING MATERIAL, METHOD OF FORMING RESIST PATTERN, AND M...
- Publication number 20110269076
- Publication date Nov 3, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Isao HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100233626
- Publication date Sep 16, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Junichi Tsuchiya

Person

Patents Grantslast 30 patents

Hard mask-forming composition and method for manufacturing electron...

Hard mask-forming composition and method for manufacturing electron...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Method of recovering resist pattern

Method of forming resist pattern

Method of forming resist pattern

Method of producing polymeric compound, resist composition and meth...

Resist composition, method of forming resist pattern, compound, and...

Method for forming resist pattern and resist composition

Resist composition and resist pattern forming method

Method for forming resist pattern

Resist composition, compound, polymeric compound and method of form...

Resist composition and method for forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Resist composition, method of forming resist pattern, polymeric com...

Surface modifying material, method of forming resist pattern, and m...

Resist composition, and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Patents Applicationslast 30 patents

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...

METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD...

UNDERCOAT AGENT, AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE...

HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

METHOD OF RECOVERING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...

METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

Resist composition, and method of forming resist pattern

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

SURFACE MODIFYING MATERIAL, METHOD OF FORMING RESIST PATTERN, AND M...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN