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Junji Asahi
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Tokyo, JP
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Patents Grants
last 30 patents
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Patent Grant
Fabrication of B-doped silicon film by LPCVD method using BCI3 and...
Patent number
6,905,963
Issue date
Jun 14, 2005
Hitachi Kokusai Electric, Inc.
Takaaki Noda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
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Patent Application
Method for fabricating a semiconductor device and a substrate proce...
Publication number
20030077920
Publication date
Apr 24, 2003
Hitachi Kokusai Electric Inc.
Takaaki Noda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...