Junji NAKANISHI

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method for producing resist pattern, and met...
- Patent number 11,543,749
- Issue date Jan 3, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 10,365,560
- Issue date Jul 30, 2019
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,740,097
- Issue date Aug 22, 2017
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 9,201,303
- Issue date Dec 1, 2015
- Sumitomo Chemical Company, Limited
- Maki Kawamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplified photoresist composition
- Patent number 8,927,194
- Issue date Jan 6, 2015
- Sumitomo Chemical Company, Limited
- Maki Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplifying type positive resist composition
- Patent number 6,953,651
- Issue date Oct 11, 2005
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,537,726
- Issue date Mar 25, 2003
- Sumitomo Chemical Company, Limited
- Junji Nakanishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...
- Publication number 20210278765
- Publication date Sep 9, 2021
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291465
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291466
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130330669
- Publication date Dec 12, 2013
- Maki KAWAMURA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION
- Publication number 20130101940
- Publication date Apr 25, 2013
- Sumitomo Chemical Company, Limited
- Maki KAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20040076902
- Publication date Apr 22, 2004
- Junji Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplifying type positive resist composition
- Publication number 20020164540
- Publication date Nov 7, 2002
- Junji Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplifying type positive resist composition
- Publication number 20020147259
- Publication date Oct 10, 2002
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20010016298
- Publication date Aug 23, 2001
- Junji Nakanishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Junji NAKANISHI

Person

Patents Grantslast 30 patents

Resist composition and method for producing resist pattern, and met...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition

Chemical amplified photoresist composition

Chemical amplifying type positive resist composition

Chemically amplified positive resist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION

CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION

Chemical amplification type positive resist composition

Chemical amplifying type positive resist composition

Chemical amplifying type positive resist composition

Chemically amplified positive resist composition