Junya HORIUCHI

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 12,134,596
- Issue date Nov 5, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 11,747,728
- Issue date Sep 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya Horiuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,577,323
- Issue date Mar 3, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,364,314
- Issue date Jul 30, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...
- Publication number 20240319600
- Publication date Sep 26, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...
- Publication number 20240117102
- Publication date Apr 11, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20240117101
- Publication date Apr 11, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...
- Publication number 20240109997
- Publication date Apr 4, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...
- Publication number 20230314942
- Publication date Oct 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...
- Publication number 20230296982
- Publication date Sep 21, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220155682
- Publication date May 19, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...
- Publication number 20220089810
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20220089811
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220019146
- Publication date Jan 20, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Masahiro YAMANE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220010072
- Publication date Jan 13, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Kouichi YAMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210405529
- Publication date Dec 30, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210278767
- Publication date Sep 9, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masayoshi UENO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210165327
- Publication date Jun 3, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20210109448
- Publication date Apr 15, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20200361843
- Publication date Nov 19, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takashi MAKINOSHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20200166844
- Publication date May 28, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Kana OKADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COM...
- Publication number 20200002307
- Publication date Jan 2, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Naoya UCHIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...
- Publication number 20180208703
- Publication date Jul 26, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Kana OKADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...
- Publication number 20180065930
- Publication date Mar 8, 2018
- Kana OKADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...
- Publication number 20180044270
- Publication date Feb 15, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C07 - ORGANIC CHEMISTRY

Junya HORIUCHI

Person

Patents Grantslast 30 patents

Compound, resin, composition, resist pattern formation method, circ...

Compound, resin, composition, resist pattern formation method, circ...

Compound, resin, material for forming underlayer film for lithograp...

Compound, resin, material for forming underlayer film for lithograp...

Patents Applicationslast 30 patents

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...

POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COM...

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...