Junzi Zhao

Person

Cupertino, CA, US

People

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE CONTROL FOR ECMP PROCESS
- Publication number 20090036032
- Publication date Feb 5, 2009
- Yongqi Hu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMPOSITION FOR POLISHING A SUBSTRATE
- Publication number 20080035882
- Publication date Feb 14, 2008
- Junzi Zhao
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ABRASIVE COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING
- Publication number 20070254485
- Publication date Nov 1, 2007
- Daxin Mao
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Temperature control for ECMP process
- Publication number 20070227901
- Publication date Oct 4, 2007
- APPLIED MATERIALS, INC.
- Yongqi Hu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Process and composition for electrochemical mechanical polishing
- Publication number 20060249395
- Publication date Nov 9, 2006
- Applied Material, Inc.
- You Wang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and composition for polishing a substrate
- Publication number 20060175298
- Publication date Aug 10, 2006
- Junzi Zhao
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and composition for polishing a substrate
- Publication number 20060169674
- Publication date Aug 3, 2006
- Daxin Mao
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Person

Patents Applicationslast 30 patents

TEMPERATURE CONTROL FOR ECMP PROCESS

COMPOSITION FOR POLISHING A SUBSTRATE

ABRASIVE COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING

Temperature control for ECMP process

Process and composition for electrochemical mechanical polishing

Method and composition for polishing a substrate

Method and composition for polishing a substrate