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Jurij R. Paraszcszak
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Ossining, NY, US
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Patent Grant
Halogenated polystyrenes for electron beam, X-ray and photo resists
Patent number
4,678,850
Issue date
Jul 7, 1987
International Business Machines Corp.
Michael Hatzakis
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...