Juying Dou

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method, apparatus, and system for wafer grounding
- Patent number 12,051,562
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron emitter and method of fabricating same
- Patent number 11,688,579
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Juying Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron emitter and method of fabricating same
- Patent number 11,201,032
- Issue date Dec 14, 2021
- ASML Netherlands B.V.
- Juying Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron emitter and method of fabricating same
- Patent number 10,784,071
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Juying Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,541,110
- Issue date Jan 21, 2020
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer grounding and biasing method, apparatus, and application
- Patent number 9,991,147
- Issue date Jun 5, 2018
- Hermes Microvision, Inc.
- Yi-Xiang Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,922,799
- Issue date Mar 20, 2018
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer grounding and biasing method, apparatus, and application
- Patent number 8,908,348
- Issue date Dec 9, 2014
- Hermes Microvision, Inc.
- Yi-Xiang Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Filament for electron source
- Patent number 8,896,195
- Issue date Nov 25, 2014
- Hermes Microvision, Inc.
- Juying Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for increasing electric conductivity to a semiconductor w...
- Patent number 8,218,284
- Issue date Jul 10, 2012
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Wafer grounding methodology
- Patent number 8,094,428
- Issue date Jan 10, 2012
- Hermes-Microvision, Inc.
- Yi Xiang Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Thermal field emission cathode
- Patent number 8,022,609
- Issue date Sep 20, 2011
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus
- Patent number 7,960,697
- Issue date Jun 14, 2011
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus
- Patent number 7,759,653
- Issue date Jul 20, 2010
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING
- Publication number 20240371599
- Publication date Nov 7, 2024
- ASML Netheriands B. V.
- Yixiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND APPARATUS FOR STABILIZING ELECTRON SOURCES IN CHARGED PA...
- Publication number 20240347311
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Bruno LA FONTAINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240014003
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING
- Publication number 20220277926
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Yixiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EMITTER AND METHOD OF FABRICATING SAME
- Publication number 20220189725
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Juying DOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210384008
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EMITTER AND METHOD OF FABRICATING SAME
- Publication number 20210142975
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Juying Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200152421
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EMITTER AND METHOD OF FABRICATING SAME
- Publication number 20190172674
- Publication date Jun 6, 2019
- ASML Netherlands B.V.
- Juying DOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20180350555
- Publication date Dec 6, 2018
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of Plural Charged-Particle Beams
- Publication number 20170025241
- Publication date Jan 26, 2017
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION
- Publication number 20150049411
- Publication date Feb 19, 2015
- HERMES MICROVISION INC.
- YI-XIANG WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filament for Electron Source
- Publication number 20120098409
- Publication date Apr 26, 2012
- Hermes Microvision, Inc.
- Juying DOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL FIELD EMISSION CATHODE
- Publication number 20110084591
- Publication date Apr 14, 2011
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION
- Publication number 20110051306
- Publication date Mar 3, 2011
- Hermes Microvision, Inc.
- YI-XIANG WANG
- B82 - NANO-TECHNOLOGY
Information Patent Application
WAFER GROUNDING METHODOLOGY
- Publication number 20100103583
- Publication date Apr 29, 2010
- HERMES-MICROVISION, INC.
- YI XIANG WANG
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM APPARATUS
- Publication number 20100102227
- Publication date Apr 29, 2010
- HERMES-MICROVISION, INC
- ZHONGWEI CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR INCREASING ELECTRIC CONDUCTIVITY TO A SEMICONDUCTOR W...
- Publication number 20100019462
- Publication date Jan 28, 2010
- Hermes-Microvision, Inc.
- Zhong-Wei CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
THERMAL FIELD EMISSION CATHODE
- Publication number 20090315444
- Publication date Dec 24, 2009
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS
- Publication number 20090294664
- Publication date Dec 3, 2009
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method, apparatus, and system for wafer grounding

Apparatus of plural charged-particle beams

Electron emitter and method of fabricating same

Electron emitter and method of fabricating same

Apparatus of plural charged-particle beams

Electron emitter and method of fabricating same

Apparatus of plural charged-particle beams

Wafer grounding and biasing method, apparatus, and application

Apparatus of plural charged-particle beams

Wafer grounding and biasing method, apparatus, and application

Filament for electron source

Apparatus for increasing electric conductivity to a semiconductor w...

Wafer grounding methodology

Thermal field emission cathode

Electron beam apparatus

Electron beam apparatus

Patents Applicationslast 30 patents

METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING

SYSTEM AND APPARATUS FOR STABILIZING ELECTRON SOURCES IN CHARGED PA...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING

ELECTRON EMITTER AND METHOD OF FABRICATING SAME

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ELECTRON EMITTER AND METHOD OF FABRICATING SAME

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ELECTRON EMITTER AND METHOD OF FABRICATING SAME

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Apparatus of Plural Charged-Particle Beams

WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION

Filament for Electron Source

THERMAL FIELD EMISSION CATHODE

WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION

WAFER GROUNDING METHODOLOGY

ELECTRON BEAM APPARATUS

APPARATUS FOR INCREASING ELECTRIC CONDUCTIVITY TO A SEMICONDUCTOR W...

THERMAL FIELD EMISSION CATHODE

ELECTRON BEAM APPARATUS