Kaichiro Nakano

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 8,969,483
- Issue date Mar 3, 2015
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 8,802,798
- Issue date Aug 12, 2014
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 8,802,783
- Issue date Aug 12, 2014
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electricity storage device
- Patent number 8,617,744
- Issue date Dec 31, 2013
- NEC Corporation
- Kentaro Nakahara
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Photosensitive resin composition for optical waveguide formation, o...
- Patent number 8,414,733
- Issue date Apr 9, 2013
- NEC Corporation
- Katsumi Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ferrule, and method of producing an optical waveguide connector, an...
- Patent number 8,388,238
- Issue date Mar 5, 2013
- Sumitomo Electric Industries, Ltd.
- Masaki Ohmura
- G02 - OPTICS
Information Patent Grant
Optical connector
- Patent number 8,297,855
- Issue date Oct 30, 2012
- Japan Aviation Electronics Industry, Limited
- Yuichi Koreeda
- G02 - OPTICS
Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 8,119,751
- Issue date Feb 21, 2012
- NEC Corporation
- Katsumi Maeda
Information Patent Grant
Photosensitive resin composition for optical waveguide formation, o...
- Patent number 7,847,017
- Issue date Dec 7, 2010
- NEC Corporation
- Katsumi Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Alicyclic unsaturated compound, polymer, chemically amplified resis...
- Patent number 7,470,499
- Issue date Dec 30, 2008
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Styrene derivative, styrene polymer, photosensitive resin compositi...
- Patent number 7,439,005
- Issue date Oct 21, 2008
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 7,432,035
- Issue date Oct 7, 2008
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Structure and method for mounting LSI package onto photoelectric wi...
- Patent number 7,333,683
- Issue date Feb 19, 2008
- NEC Corproation
- Junichi Sasaki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Monomer having fluorine-containing acetal or ketal structure, polym...
- Patent number 7,232,639
- Issue date Jun 19, 2007
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Unsaturated monomers, polymers, chemically-amplified resist composi...
- Patent number 7,192,682
- Issue date Mar 20, 2007
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
(Meth) acrylate derivative, polymer and photoresist composition hav...
- Patent number 7,186,495
- Issue date Mar 6, 2007
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist resin, chemical amplification type resist, and method of for...
- Patent number 6,924,079
- Issue date Aug 2, 2005
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators, photoresist compositions containing the same...
- Patent number 6,849,384
- Issue date Feb 1, 2005
- NEC Corporation
- Shigeyuki Iwasa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing phenylmaleimide derivative, polymer, chemically...
- Patent number 6,746,722
- Issue date Jun 8, 2004
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist, polymer for the chemically amplified r...
- Patent number 6,710,188
- Issue date Mar 23, 2004
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist, polymer for the chemically amplified r...
- Patent number 6,639,084
- Issue date Oct 28, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generator containing two kinds of sulfonium salt compound...
- Patent number 6,638,685
- Issue date Oct 28, 2003
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt compound and resist composition and pattern forming...
- Patent number 6,602,647
- Issue date Aug 5, 2003
- NEC Corporation
- Shigeyuki Iwasa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(Meth)acrylate, polymer, photoresist composition, and pattern formi...
- Patent number 6,559,337
- Issue date May 6, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt compound, photoresist composition and method for pat...
- Patent number 6,528,232
- Issue date Mar 4, 2003
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative photoresist composition using polymer having 1,2-diol stru...
- Patent number 6,469,197
- Issue date Oct 22, 2002
- NEC Corporation
- Katsumi Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
(Meth)acrylate, polymer photoresist composition, and pattern formin...
- Patent number 6,391,529
- Issue date May 21, 2002
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and patterning method using the same
- Patent number 6,352,813
- Issue date Mar 5, 2002
- NEC Corporation
- Kaichiro Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist large in transparency and sensitivity t...
- Patent number 6,287,746
- Issue date Sep 11, 2001
- NEC Corporation
- Kaichiro Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
(Meth)acrylate, polymer, photoresist composition, and pattern formi...
- Patent number 6,248,499
- Issue date Jun 19, 2001
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...
- Publication number 20150183912
- Publication date Jul 2, 2015
- NEC Corporation
- Katsumi MAEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...
- Publication number 20130122419
- Publication date May 16, 2013
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...
- Publication number 20120178023
- Publication date Jul 12, 2012
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SECONDARY BATTERY
- Publication number 20120171542
- Publication date Jul 5, 2012
- NEC CORPORATION
- Kazuaki Matsumoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ELECTRICITY STORAGE DEVICE
- Publication number 20120100437
- Publication date Apr 26, 2012
- NEC Corporation
- Kentaro Nakahara
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...
- Publication number 20110196122
- Publication date Aug 11, 2011
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SECONDARY BATTERY
- Publication number 20110159379
- Publication date Jun 30, 2011
- NEC Corporation
- Kazuaki Matsumoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION, O...
- Publication number 20110044597
- Publication date Feb 24, 2011
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR CONTROL OF REFRACTIVE...
- Publication number 20100329616
- Publication date Dec 30, 2010
- Ning-Juan Chen
- G02 - OPTICS
Information Patent Application
POLYMER OPTICAL WAVEGUIDE FORMING MATERIAL, POLYMER OPTICAL WAVEGUI...
- Publication number 20100150506
- Publication date Jun 17, 2010
- NEC CORPORATION
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OPTICAL CONNECTOR
- Publication number 20100054673
- Publication date Mar 4, 2010
- Yuichi Koreeda
- G02 - OPTICS
Information Patent Application
FERRULE, AND METHOD OF PRODUCING AN OPTICAL WAVEGUIDE CONNECTOR, AN...
- Publication number 20100014815
- Publication date Jan 21, 2010
- Masaki Ohmura
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION, O...
- Publication number 20090046986
- Publication date Feb 19, 2009
- NEC CORPORATION
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Publication number 20090023878
- Publication date Jan 22, 2009
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Publication number 20070218403
- Publication date Sep 20, 2007
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Optical input substrate, optical output substrate, optical input/ou...
- Publication number 20070165979
- Publication date Jul 19, 2007
- Mikio Oda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical-element integrated semiconductor integrated circuit and fab...
- Publication number 20070164297
- Publication date Jul 19, 2007
- Mikio Oda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Styrene derivative, styrene polymer, photosensitive resin compositi...
- Publication number 20070134586
- Publication date Jun 14, 2007
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition for forming optical waveguide, opt...
- Publication number 20070041698
- Publication date Feb 22, 2007
- NEC Corporation
- Katsumi Maeda
- G02 - OPTICS
Information Patent Application
Structure and method for mounting LSI package onto photoelectric wi...
- Publication number 20060078248
- Publication date Apr 13, 2006
- NEC Corporation
- Junichi Sasaki
- G02 - OPTICS
Information Patent Application
Alicyclic unsaturated compound, polymer, chemically amplified resis...
- Publication number 20060073408
- Publication date Apr 6, 2006
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Monomer having fluorine-containing acetalor ketal structure, polyme...
- Publication number 20050164119
- Publication date Jul 28, 2005
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Unsaturated monomers, polymers, chemically amplified resist composi...
- Publication number 20040265732
- Publication date Dec 30, 2004
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified resist, polymer for the chemically amplified r...
- Publication number 20030224297
- Publication date Dec 4, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist resin, chemical amplification type resist, and method of for...
- Publication number 20030211734
- Publication date Nov 13, 2003
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoacid generators, photoresist compositions containing the same...
- Publication number 20030198889
- Publication date Oct 23, 2003
- Shigeyuki Iwasa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical amplified resist, polymer for the chemically amplified res...
- Publication number 20030097008
- Publication date May 22, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-containing phenylmaleimide derivative, polymer, chemically...
- Publication number 20030036618
- Publication date Feb 20, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoacid generator containing two kinds of sulfonium salt compound...
- Publication number 20020182535
- Publication date Dec 5, 2002
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
(Meth) acrylate, polymer, photoresist composition, and pattern form...
- Publication number 20020111509
- Publication date Aug 15, 2002
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kaichiro Nakano

Person

Patents Grantslast 30 patents

(Meth)acrylate derivative, polymer and photoresist composition havi...

(Meth)acrylate derivative, polymer and photoresist composition havi...

(Meth)acrylate derivative, polymer and photoresist composition havi...

Electricity storage device

Photosensitive resin composition for optical waveguide formation, o...

Ferrule, and method of producing an optical waveguide connector, an...

Optical connector

(Meth)acrylate derivative, polymer and photoresist composition havi...

Photosensitive resin composition for optical waveguide formation, o...

Alicyclic unsaturated compound, polymer, chemically amplified resis...

Styrene derivative, styrene polymer, photosensitive resin compositi...

(Meth)acrylate derivative, polymer and photoresist composition havi...

Structure and method for mounting LSI package onto photoelectric wi...

Monomer having fluorine-containing acetal or ketal structure, polym...

Unsaturated monomers, polymers, chemically-amplified resist composi...

(Meth) acrylate derivative, polymer and photoresist composition hav...

Resist resin, chemical amplification type resist, and method of for...

Photoacid generators, photoresist compositions containing the same...

Fluorine-containing phenylmaleimide derivative, polymer, chemically...

Chemically amplified resist, polymer for the chemically amplified r...

Chemically amplified resist, polymer for the chemically amplified r...

Photoacid generator containing two kinds of sulfonium salt compound...

Sulfonium salt compound and resist composition and pattern forming...

(Meth)acrylate, polymer, photoresist composition, and pattern formi...

Sulfonium salt compound, photoresist composition and method for pat...

Negative photoresist composition using polymer having 1,2-diol stru...

(Meth)acrylate, polymer photoresist composition, and pattern formin...

Photosensitive resin composition and patterning method using the same

Chemically amplified resist large in transparency and sensitivity t...

(Meth)acrylate, polymer, photoresist composition, and pattern formi...

Patents Applicationslast 30 patents

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...

SECONDARY BATTERY

ELECTRICITY STORAGE DEVICE

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...

SECONDARY BATTERY

PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION, O...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR CONTROL OF REFRACTIVE...

POLYMER OPTICAL WAVEGUIDE FORMING MATERIAL, POLYMER OPTICAL WAVEGUI...

OPTICAL CONNECTOR

FERRULE, AND METHOD OF PRODUCING AN OPTICAL WAVEGUIDE CONNECTOR, AN...

PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION, O...

(Meth)acrylate derivative, polymer and photoresist composition havi...

(Meth)acrylate derivative, polymer and photoresist composition havi...

Optical input substrate, optical output substrate, optical input/ou...

Optical-element integrated semiconductor integrated circuit and fab...

Styrene derivative, styrene polymer, photosensitive resin compositi...

Photosensitive resin composition for forming optical waveguide, opt...

Structure and method for mounting LSI package onto photoelectric wi...

Alicyclic unsaturated compound, polymer, chemically amplified resis...

Monomer having fluorine-containing acetalor ketal structure, polyme...

Unsaturated monomers, polymers, chemically amplified resist composi...

Chemically amplified resist, polymer for the chemically amplified r...

Resist resin, chemical amplification type resist, and method of for...

Photoacid generators, photoresist compositions containing the same...

Chemical amplified resist, polymer for the chemically amplified res...

Fluorine-containing phenylmaleimide derivative, polymer, chemically...

Photoacid generator containing two kinds of sulfonium salt compound...

(Meth) acrylate, polymer, photoresist composition, and pattern form...