Kallol Bera

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic holding structures for plasma processing applications
- Patent number 12,020,965
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensor for monitoring gas concentration
- Patent number 11,959,868
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contour pocket and hybrid susceptor for wafer uniformity
- Patent number 11,810,810
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Kaushal Gangakhedkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensor for chamber condition monitoring
- Patent number 11,581,206
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contour pocket and hybrid susceptor for wafer uniformity
- Patent number 11,557,501
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Kaushal Gangakhedkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 11,315,769
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 11,315,763
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recursive inject apparatus for improved distribution of gas
- Patent number 11,198,939
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Aaron Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead with interlaced gas feed and removal and methods of use
- Patent number 11,189,502
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode array in ceiling
- Patent number 11,114,284
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular high-frequency source
- Patent number 11,081,317
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 10,903,056
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie shaped treatment
- Patent number 10,879,042
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 10,763,085
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contour pocket and hybrid susceptor for wafer uniformity
- Patent number 10,685,864
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Kaushal Gangakhedkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recursive inject apparatus for improved distribution of gas
- Patent number 10,633,741
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Aaron Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing tool with electrically switched electrode assembly
- Patent number 10,510,515
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for controlling temperature uniformity of a substrate
- Patent number 10,386,126
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Top lamp module for carousel deposition chamber
- Patent number 10,273,578
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lateral plasma/radical source
- Patent number 10,121,655
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Annular baffle
- Patent number 10,012,248
- Issue date Jul 3, 2018
- Applied Materials, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF multi-feed structure to improve plasma uniformity
- Patent number 9,711,330
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-substrate thermal management apparatus
- Patent number 9,696,097
- Issue date Jul 4, 2017
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Temperature controlled chamber liner
- Patent number 9,653,267
- Issue date May 16, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240297059
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20240282554
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20240271284
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Kallol BERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS
- Publication number 20240249924
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION
- Publication number 20240219337
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION
- Publication number 20230377855
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Mukesh Shivakumaraiah CHITRADURGA
- B08 - CLEANING
Information Patent Application
CONTOUR POCKET AND HYBRID SUSCEPTOR FOR WAFER UNIFORMITY
- Publication number 20230116396
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Kaushal Gangakhedkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING PLASMA WITH ION BLOCKER PLATE
- Publication number 20230107392
- Publication date Apr 6, 2023
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, METHODS, AND APPARATUS FOR APPLYING A BIAS VOLTAGE TO AN I...
- Publication number 20220333245
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Xiaopu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION
- Publication number 20220244205
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC-MATERIAL SHIELD AROUND PLASMA CHAMBERS NEAR PEDESTAL
- Publication number 20220139679
- Publication date May 5, 2022
- Applied Materials, Inc.
- Job George KONNOTH JOSEPH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20220122866
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION
- Publication number 20220064797
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Akshay DHANAKSHIRUR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
- Publication number 20220051910
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20220028710
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20210327685
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Thai Cheng CHUA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210327686
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING
- Publication number 20210280443
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20210269919
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Kallol BERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Plasma Source to Generate Pie-Shaped Treatment
- Publication number 20210210312
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20210166923
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20200395194
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contour Pocket and Hybrid Susceptor for Wafer Uniformity
- Publication number 20200312702
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Kaushal Gangakhedkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Recursive Inject Apparatus For Improved Distribution Of Gas
- Publication number 20200255943
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Aaron Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL
- Publication number 20200161093
- Publication date May 21, 2020
- Applied Materials, Inc.
- Xiaopu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20190326095
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE
- Publication number 20190311920
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20190189404
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING
- Publication number 20180374685
- Publication date Dec 27, 2018
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kallol Bera

Person

Patents Grantslast 30 patents

Symmetric plasma source to generate pie-shaped treatment

Magnetic holding structures for plasma processing applications

Modular high-frequency source

Magnetic-material shield around plasma chambers near pedestal

Capacitive sensor for monitoring gas concentration

Shunt door for magnets in plasma process chamber

Device and method for tuning plasma distribution using phase control

Microwave plasma source for spatial plasma enhanced atomic layer de...

Contour pocket and hybrid susceptor for wafer uniformity

Capacitive sensor for chamber condition monitoring

Contour pocket and hybrid susceptor for wafer uniformity

Plasma source for rotating susceptor

Shaped electrodes for improved plasma exposure from vertical plasma...

Recursive inject apparatus for improved distribution of gas

Showerhead with interlaced gas feed and removal and methods of use

Plasma reactor with electrode array in ceiling

Modular high-frequency source

Plasma source for rotating susceptor

Symmetric plasma source to generate pie shaped treatment

Shaped electrodes for improved plasma exposure from vertical plasma...

Contour pocket and hybrid susceptor for wafer uniformity

Recursive inject apparatus for improved distribution of gas

Processing tool with electrically switched electrode assembly

Apparatus for controlling temperature uniformity of a substrate

Top lamp module for carousel deposition chamber

Lateral plasma/radical source

Annular baffle

RF multi-feed structure to improve plasma uniformity

Multi-substrate thermal management apparatus

Temperature controlled chamber liner

Patents Applicationslast 30 patents

MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS

MODULAR HIGH-FREQUENCY SOURCE

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS

CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION

LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION

CONTOUR POCKET AND HYBRID SUSCEPTOR FOR WAFER UNIFORMITY

METHOD AND APPARATUS FOR GENERATING PLASMA WITH ION BLOCKER PLATE

SYSTEMS, METHODS, AND APPARATUS FOR APPLYING A BIAS VOLTAGE TO AN I...

CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION

MAGNETIC-MATERIAL SHIELD AROUND PLASMA CHAMBERS NEAR PEDESTAL

MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS

SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION

Showerhead With Interlaced Gas Feed And Removal And Methods Of Use

DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS

MODULAR HIGH-FREQUENCY SOURCE

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

Symmetric Plasma Source to Generate Pie-Shaped Treatment

Plasma Source For Rotating Susceptor

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

Contour Pocket and Hybrid Susceptor for Wafer Uniformity

Recursive Inject Apparatus For Improved Distribution Of Gas

DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL

MODULAR HIGH-FREQUENCY SOURCE

SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING