Kam Tung Li

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Hsinchu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Determining exposure time of wafer photolithography process
- Patent number 6,756,168
- Issue date Jun 29, 2004
- Mosel Vitelic, Inc.
- Jiunn Yann Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for protecting stepper alignment marks
- Patent number 6,342,426
- Issue date Jan 29, 2002
- Mosel Vitelic Inc
- Kam-Tung Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to determine the dark-to-clear exposure dose for the swing c...
- Patent number 6,228,661
- Issue date May 8, 2001
- Mosel Vitelic Inc
- Kam-tung Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for actually measuring misalignment of via
- Patent number 6,190,928
- Issue date Feb 20, 2001
- Mosel Vitelic Incorporated
- Yung-Tsun Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Determining exposure time of wafer photolithography process
- Publication number 20030036270
- Publication date Feb 20, 2003
- MOSEL VITELIC, INC.
- Jiunn Yann Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY