Kanako MEYA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method and composition for resist pattern-refinement
- Patent number 10,216,090
- Issue date Feb 26, 2019
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double patterning method
- Patent number 8,927,200
- Issue date Jan 6, 2015
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20190155162
- Publication date May 23, 2019
- JSR Corporation
- Kanako MEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20160291462
- Publication date Oct 6, 2016
- JSR Corporation
- Kanako MEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE PATTERNING METHOD
- Publication number 20140080066
- Publication date Mar 20, 2014
- JSR Corporation
- Kanako MEYA
- H01 - BASIC ELECTRIC ELEMENTS