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Kang-Lie Chiang
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Process kit erosion and service life prediction
Patent number
10,770,321
Issue date
Sep 8, 2020
Applied Materials, Inc.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process kit erosion and service life prediction
Patent number
10,177,018
Issue date
Jan 8, 2019
Applied Materials, Inc.
Kang-Lie Chiang
G01 - MEASURING TESTING
Information
Patent Grant
Local and global reduction of critical dimension (CD) asymmetry in...
Patent number
9,281,190
Issue date
Mar 8, 2016
Applied Materials, Inc.
Kang-lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods for forming ultra thin structures on a substrate
Patent number
7,981,812
Issue date
Jul 19, 2011
Applied Materials, Inc.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
7,186,943
Issue date
Mar 6, 2007
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
7,132,618
Issue date
Nov 7, 2006
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
Patent number
7,030,335
Issue date
Apr 18, 2006
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for modifying dielectric characteristics of dielectric layers
Patent number
6,921,727
Issue date
Jul 26, 2005
Applied Materials, Inc.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Capacitively coupled plasma reactor with uniform radial distributio...
Patent number
6,900,596
Issue date
May 31, 2005
Applied Materials, Inc.
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
6,894,245
Issue date
May 17, 2005
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of etching an anisotropic profile in platinum
Patent number
6,749,770
Issue date
Jun 15, 2004
Jeng H. Hwang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Gas distribution plate electrode for a plasma receptor
Patent number
6,677,712
Issue date
Jan 13, 2004
Applied Materials Inc.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas distribution plate electrode for a plasma reactor
Patent number
6,586,886
Issue date
Jul 1, 2003
Applied Materials, Inc.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of rapid wafer bumping
Patent number
6,403,399
Issue date
Jun 11, 2002
LSI Logic Corporation
Senol Pekin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for preventing corrosion of a dielectric material
Patent number
6,368,517
Issue date
Apr 9, 2002
Applied Materials, Inc.
Jeng H. Hwang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etching methods for anisotropic platinum profile
Patent number
6,323,132
Issue date
Nov 27, 2001
Applied Materials, Inc.
Jeng H. Hwang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
PROCESS KIT EROSION AND SERVICE LIFE PREDICTION
Publication number
20190148194
Publication date
May 16, 2019
Applied Materials, Inc.
Kang-Lie CHIANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PROCESS KIT EROSION AND SERVICE LIFE PREDICTION
Publication number
20180047599
Publication date
Feb 15, 2018
Applied Materials, Inc.
Kang-Lie CHIANG
G01 - MEASURING TESTING
Information
Patent Application
LOCAL AND GLOBAL REDUCTION OF CRITICAL DIMENSION (CD) ASYMMETRY IN...
Publication number
20140273466
Publication date
Sep 18, 2014
Kang-lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF SUBSTRATE POLYMER REMOVAL
Publication number
20090293907
Publication date
Dec 3, 2009
Nancy Fung
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS OF FOR FORMING ULTRA THIN STRUCTURES ON A SUBSTRATE
Publication number
20090035944
Publication date
Feb 5, 2009
APPLIED MATERIALS, INC.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Post-etch treatment to remove residues
Publication number
20060102197
Publication date
May 18, 2006
Kang-Lie Chiang
B08 - CLEANING
Information
Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20050236377
Publication date
Oct 27, 2005
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20040211759
Publication date
Oct 28, 2004
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for modifying dielectric characteristics of dielectric layers
Publication number
20040180556
Publication date
Sep 16, 2004
APPLIED MATERIALS, INC.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor with uniform radial distributio...
Publication number
20040056602
Publication date
Mar 25, 2004
APPLIED MATERIALS, INC.
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Cathode pedestal for a plasma etch reactor
Publication number
20040040664
Publication date
Mar 4, 2004
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
Publication number
20030201723
Publication date
Oct 30, 2003
APPLIED MATERIALS, INC.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20030136766
Publication date
Jul 24, 2003
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
Publication number
20030111961
Publication date
Jun 19, 2003
APPLIED MATERIALS, INC.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with overhead RF electrode tuned to the plasma with...
Publication number
20020108933
Publication date
Aug 15, 2002
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of etching an anisotropic profile in platinum
Publication number
20020037647
Publication date
Mar 28, 2002
Jeng H. Hwang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method for allowing a stable power transmission into a plasma proce...
Publication number
20010050267
Publication date
Dec 13, 2001
Jeng H. Hwang
H01 - BASIC ELECTRIC ELEMENTS