Kanshi Chinone

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for CMP and polishing method using the same
- Patent number 8,853,082
- Issue date Oct 7, 2014
- Hitachi Chemical Company, Ltd.
- Masayuki Hanano
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive compounds for semiconductor planarization
- Patent number 8,439,995
- Issue date May 14, 2013
- Hitachi Chemical Co., Ltd.
- Kanshi Chinone
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing oxide particles, slurry, polishing slurry, and...
- Patent number 8,328,893
- Issue date Dec 11, 2012
- Hitachi Chemical Co., Ltd.
- Takafumi Sakurada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cerium salt, producing method thereof, cerium oxide and cerium base...
- Patent number 8,323,604
- Issue date Dec 4, 2012
- Hitachi Chemical Co., Ltd.
- Kanshi Chinone
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
CERIUM SALT, PRODUCING METHOD THEREOF, SERIUM OXIDE AND CERIUM BASE...
- Publication number 20130014446
- Publication date Jan 17, 2013
- HITACHI CHEMICAL CO., Ltd.
- Kanshi CHINONE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR CMP AND POLISHING METHOD USING THE SAME
- Publication number 20120315763
- Publication date Dec 13, 2012
- Hitachi Chemical Company, Ltd.
- Masayuki Hanano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CERIUM SALT, PRODUCING METHOD THEREOF, CERIUM OXIDE AND CERIUM BASE...
- Publication number 20110006251
- Publication date Jan 13, 2011
- HITACHI CHEMICAL CO., Ltd.
- Kanshi CHINONE
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ABRASIVE COMPOUNDS FOR SEMICONDUCTOR PLANARIZATION
- Publication number 20100192472
- Publication date Aug 5, 2010
- HITACHI CHEMICAL CO., Ltd.
- Kanshi CHINONE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of Producing Oxide Particles, Slurry, Polishing Slurry, and...
- Publication number 20090165396
- Publication date Jul 2, 2009
- Hitachi Chemical Co., Ltd.
- Takafumi Sakurada
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Cerium salt, producing method thereof, cerium oxide and cerium base...
- Publication number 20070166216
- Publication date Jul 19, 2007
- HITACHI CHEMICAL CO., Ltd.
- Kanshi Chinone
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Abrasive compounds for semiconductor planarization
- Publication number 20060283092
- Publication date Dec 21, 2006
- HITACHI CHEMICAL CO., Ltd.
- Kanshi Chinone
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Kanshi Chinone

Person

Patents Grantslast 30 patents

Polishing solution for CMP and polishing method using the polishing...

Polishing liquid for CMP and polishing method using the same

Abrasive compounds for semiconductor planarization

Method of producing oxide particles, slurry, polishing slurry, and...

Cerium salt, producing method thereof, cerium oxide and cerium base...

Patents Applicationslast 30 patents

CERIUM SALT, PRODUCING METHOD THEREOF, SERIUM OXIDE AND CERIUM BASE...

POLISHING LIQUID FOR CMP AND POLISHING METHOD USING THE SAME

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

CERIUM SALT, PRODUCING METHOD THEREOF, CERIUM OXIDE AND CERIUM BASE...

ABRASIVE COMPOUNDS FOR SEMICONDUCTOR PLANARIZATION

Method of Producing Oxide Particles, Slurry, Polishing Slurry, and...

Cerium salt, producing method thereof, cerium oxide and cerium base...

Abrasive compounds for semiconductor planarization