Kaori Sakai

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 10,146,130
- Issue date Dec 4, 2018
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 9,690,192
- Issue date Jun 27, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base film-forming composition, and directed self-assembly lithograp...
- Patent number 9,557,644
- Issue date Jan 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,487,868
- Issue date Nov 8, 2016
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming pattern
- Patent number 8,808,974
- Issue date Aug 19, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20170248847
- Publication date Aug 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COLORING COMPOSITION, COLORED CURED FILM, AND SOLID-STATE IMAGING E...
- Publication number 20170235225
- Publication date Aug 17, 2017
- JSR Corporation
- Yuusuke MURATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20170088740
- Publication date Mar 30, 2017
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20150301445
- Publication date Oct 22, 2015
- JSR Corporation
- Hiroyuki Komatsu
- G02 - OPTICS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20150191829
- Publication date Jul 9, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20150187581
- Publication date Jul 2, 2015
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130164695
- Publication date Jun 27, 2013
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110262865
- Publication date Oct 27, 2011
- JSR Corporation
- Yukio NISHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110223537
- Publication date Sep 15, 2011
- JSR Corporation
- Takuma Ebata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20110143279
- Publication date Jun 16, 2011
- JSR Corporation
- Tsutomu SHIMOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...
- Publication number 20100068650
- Publication date Mar 18, 2010
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kaori Sakai

Person

Patents Grantslast 30 patents

Composition for base, and directed self-assembly lithography method

Composition for base, and directed self-assembly lithography method

Base film-forming composition, and directed self-assembly lithograp...

Pattern-forming method

Method for forming pattern

Patents Applicationslast 30 patents

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

COLORING COMPOSITION, COLORED CURED FILM, AND SOLID-STATE IMAGING E...

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

PATTERN-FORMING METHOD

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

RADIATION-SENSITIVE RESIN COMPOSITION

POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...