Kaoru IWATO

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 10,248,019
- Issue date Apr 2, 2019
- FUJIFILM Corporation
- Shohei Kataoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, composition kit and resist film, and method...
- Patent number 9,915,870
- Issue date Mar 13, 2018
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,897,922
- Issue date Feb 20, 2018
- Fujifilm Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and actinic-ray- or radiation-sensitive resi...
- Patent number 9,760,003
- Issue date Sep 12, 2017
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and pattern forming method using the same
- Patent number 9,718,901
- Issue date Aug 1, 2017
- FUJIFILM Corporation
- Takuya Tsuruta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,482,958
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray- or radiation-sensitive resin composition, actinic ray-...
- Patent number 9,454,079
- Issue date Sep 27, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, resist pattern formed by the method, method...
- Patent number 9,448,482
- Issue date Sep 20, 2016
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,417,528
- Issue date Aug 16, 2016
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,411,230
- Issue date Aug 9, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,291,892
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,250,532
- Issue date Feb 2, 2016
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,223,219
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,152,048
- Issue date Oct 6, 2015
- FUJIFILM Corporation
- Hiroshi Saegusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,140,981
- Issue date Sep 22, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,097,973
- Issue date Aug 4, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,086,627
- Issue date Jul 21, 2015
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,075,310
- Issue date Jul 7, 2015
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,040,231
- Issue date May 26, 2015
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming pattern therewith
- Patent number 9,017,917
- Issue date Apr 28, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,622
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,993,211
- Issue date Mar 31, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,956,802
- Issue date Feb 17, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative pattern forming method and resist pattern
- Patent number 8,859,192
- Issue date Oct 14, 2014
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 8,822,129
- Issue date Sep 2, 2014
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, pattern, chemical amplification resist comp...
- Patent number 8,808,965
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20170102618
- Publication date Apr 13, 2017
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20160349620
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD...
- Publication number 20160018734
- Publication date Jan 21, 2016
- FUJIFILM CORPORATION
- HIROO TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150355541
- Publication date Dec 10, 2015
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE...
- Publication number 20150338743
- Publication date Nov 26, 2015
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150301451
- Publication date Oct 22, 2015
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20150293454
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD...
- Publication number 20150253673
- Publication date Sep 10, 2015
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...
- Publication number 20150248056
- Publication date Sep 3, 2015
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20150118623
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Takuya TSURUTA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE R...
- Publication number 20150118621
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Toshiaki FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20140287363
- Publication date Sep 25, 2014
- Akinori SHIBUYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140248562
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...
- Publication number 20140234761
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140234759
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...
- Publication number 20140227637
- Publication date Aug 14, 2014
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140212814
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Junichi ITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20140212796
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20140205947
- Publication date Jul 24, 2014
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20140127629
- Publication date May 8, 2014
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...
- Publication number 20140113223
- Publication date Apr 24, 2014
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN
- Publication number 20130266777
- Publication date Oct 10, 2013
- Keita KATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130202999
- Publication date Aug 8, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20130136900
- Publication date May 30, 2013
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20130122427
- Publication date May 16, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130115556
- Publication date May 9, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20130084438
- Publication date Apr 4, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20130078433
- Publication date Mar 28, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- B32 - LAYERED PRODUCTS
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130045365
- Publication date Feb 21, 2013
- FUJIFILM CORPORATION
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN...
- Publication number 20130040096
- Publication date Feb 14, 2013
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Kaoru IWATO

Person

Patents Grantslast 30 patents

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method and resist composition

Pattern forming method, composition kit and resist film, and method...

Method of forming pattern and developer for use in the method

Pattern forming method and actinic-ray- or radiation-sensitive resi...

Resin composition and pattern forming method using the same

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method and resist composition

Method of forming pattern and developer for use in the method

Actinic ray- or radiation-sensitive resin composition, actinic ray-...

Pattern forming method, resist pattern formed by the method, method...

Pattern forming method, multi-layered resist pattern, multi-layered...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, multi-layered resist pattern, multi-layered...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic-ray- or radiation-sensitive resin composition and method of...

Actinic-ray-sensitive or radiation-sensitive resin composition, and...

Method of forming pattern and developer for use in the method

Pattern forming method, multi-layered resist pattern, multi-layered...

Pattern forming method, multi-layered resist pattern, multi-layered...

Pattern forming method, multi-layered resist pattern, multi-layered...

Resist composition and method of forming pattern therewith

Pattern forming method, chemical amplification resist composition a...

Pattern forming method, chemical amplification resist composition a...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, chemical amplification resist composition a...

Negative pattern forming method and resist pattern

Pattern forming method, electron beam-sensitive or extreme ultravio...

Pattern forming method, pattern, chemical amplification resist comp...

Patents Applicationslast 30 patents

METHOD OF FORMING PATTERN

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD...

PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...

RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

METHOD OF FORMING PATTERN

PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED...

NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN...