Kaoru Maekawa

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing method that recovers damage of t...
- Patent number 7,902,077
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning a semiconductor wafer
- Patent number 6,893,954
- Issue date May 17, 2005
- Tokyo Electron Limited
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of a semiconductor device
- Patent number 6,890,848
- Issue date May 10, 2005
- Tokyo Electron Limited
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus for removing oxide film
- Patent number 6,776,874
- Issue date Aug 17, 2004
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus for removing oxide film
- Patent number 6,706,334
- Issue date Mar 16, 2004
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...
- Publication number 20110120650
- Publication date May 26, 2011
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHER...
- Publication number 20080233754
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFA...
- Publication number 20080213998
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Hiroyuki Nagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHER...
- Publication number 20070141843
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...
- Publication number 20070122752
- Publication date May 31, 2007
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Production method for semiconductor device
- Publication number 20040132277
- Publication date Jul 8, 2004
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a low dielectric film and fabrication p...
- Publication number 20040065957
- Publication date Apr 8, 2004
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication process of a semiconductor device
- Publication number 20020164869
- Publication date Nov 7, 2002
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method and apparatus for removing oxide film
- Publication number 20010015261
- Publication date Aug 23, 2001
- TOKYO ELECTRO LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Kaoru Maekawa

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing method that recovers damage of t...

Method for patterning a semiconductor wafer

Fabrication process of a semiconductor device

Processing method and apparatus for removing oxide film

Processing method and apparatus for removing oxide film

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...

SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHER...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFA...

SUBSTRATE PERIPHERAL FILM-REMOVING APPARATUS AND SUBSTRATE PERIPHER...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...

Production method for semiconductor device

Semiconductor device having a low dielectric film and fabrication p...

Fabrication process of a semiconductor device

Processing method and apparatus for removing oxide film