Kaoru Oohashi

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Assembly provided with coolant flow channel, method of controlling...
- Patent number 11,569,073
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Jun Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and heater temperature control method
- Patent number 10,629,464
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and heater temperature control method
- Patent number 10,026,631
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Kaoru Oohashi
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 9,728,381
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 9,437,402
- Issue date Sep 6, 2016
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck device
- Patent number 9,412,635
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Yasuharu Sasaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 8,904,957
- Issue date Dec 9, 2014
- Tokyo Electron Limited
- Akihiro Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate mounting table and method for manufacturing same, substra...
- Patent number 8,869,376
- Issue date Oct 28, 2014
- Tokyo Electron Limited
- Takehiro Ueda
- B32 - LAYERED PRODUCTS
Information Patent Grant
Apparatus and method for evaluating a substrate mounting device
- Patent number 8,573,836
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate mounting table and method for manufacturing same, substra...
- Patent number 8,491,752
- Issue date Jul 23, 2013
- Tokyo Electron Limited
- Takehiro Ueda
- B32 - LAYERED PRODUCTS
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 8,387,562
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma procesor and plasma processing method
- Patent number 8,056,503
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate mounting table, substrate processing apparatus and substr...
- Patent number 7,815,740
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting member and substrate processing apparatus
- Patent number 7,718,007
- Issue date May 18, 2010
- Tokyo Electron Limited
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Absorption board for an electric chuck used in semiconductor manufa...
- Patent number D553104
- Issue date Oct 16, 2007
- Tokyo Electron Limited
- Kaoru Oohashi
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD
- Publication number 20200219740
- Publication date Jul 9, 2020
- TOKYO ELECTRON LIMITED
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSEMBLY PROVIDED WITH COOLANT FLOW CHANNEL, METHOD OF CONTROLLING...
- Publication number 20190066985
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD
- Publication number 20180301362
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Kaoru Oohashi
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD
- Publication number 20170213751
- Publication date Jul 27, 2017
- TOKYO ELECTRON LIMITED
- Kaoru Oohashi
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD
- Publication number 20150132863
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20150083332
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20150083333
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE
- Publication number 20140376148
- Publication date Dec 25, 2014
- Yasuharu Sasaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRA...
- Publication number 20130299083
- Publication date Nov 14, 2013
- Takehiro UEDA
- B32 - LAYERED PRODUCTS
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20130174983
- Publication date Jul 11, 2013
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20120006492
- Publication date Jan 12, 2012
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SUBSTRATE MOUNTING TABLE
- Publication number 20080145556
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Nobuyuki NAGAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRA...
- Publication number 20080142160
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- B32 - LAYERED PRODUCTS
Information Patent Application
APPARATUS AND METHOD FOR EVALUATING A SUBSTRATE MOUNTING DEVICE
- Publication number 20080098833
- Publication date May 1, 2008
- TOKYO ELECTRON LIMITED
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate mounting table, substrate processing apparatus and substr...
- Publication number 20060207725
- Publication date Sep 21, 2006
- TOKYO ELECTRONIC LIMITED
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate supporting member and substrate processing apparatus
- Publication number 20060207507
- Publication date Sep 21, 2006
- TOKYO ELECTRON LIMITED
- Kaoru Oohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma procesor and plasma processing method
- Publication number 20040177927
- Publication date Sep 16, 2004
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kaoru Oohashi

Person

Patents Grantslast 30 patents

Assembly provided with coolant flow channel, method of controlling...

Plasma processing apparatus and heater temperature control method

Plasma processing apparatus and heater temperature control method

Plasma processor and plasma processing method

Plasma processor and plasma processing method

Electrostatic chuck device

Plasma processor and plasma processing method

Substrate mounting table and method for manufacturing same, substra...

Apparatus and method for evaluating a substrate mounting device

Substrate mounting table and method for manufacturing same, substra...

Plasma processor and plasma processing method

Plasma procesor and plasma processing method

Substrate mounting table, substrate processing apparatus and substr...

Substrate supporting member and substrate processing apparatus

Absorption board for an electric chuck used in semiconductor manufa...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD

ASSEMBLY PROVIDED WITH COOLANT FLOW CHANNEL, METHOD OF CONTROLLING...

PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD

PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD

PLASMA PROCESSING APPARATUS AND HEATER TEMPERATURE CONTROL METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

ELECTROSTATIC CHUCK DEVICE

SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRA...

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

METHOD FOR MANUFACTURING SUBSTRATE MOUNTING TABLE

SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRA...

APPARATUS AND METHOD FOR EVALUATING A SUBSTRATE MOUNTING DEVICE

Substrate mounting table, substrate processing apparatus and substr...

Substrate supporting member and substrate processing apparatus

Plasma procesor and plasma processing method