Karel Diederick Van Der Mast

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint lithography
- Patent number 9,610,727
- Issue date Apr 4, 2017
- ASML Netherlands B.V.
- Yvonne Wendela Kruijt-Stegeman
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,848,195
- Issue date Sep 30, 2014
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 8,753,557
- Issue date Jun 17, 2014
- ASML Netherlands B.V.
- Yvonne Wendela Kruijt-Stegeman
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of determining overlay error and a device manufacturing method
- Patent number 8,363,220
- Issue date Jan 29, 2013
- ASML Netherlands B.V.
- Willem Marie Julia Marcel Coene
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 8,100,684
- Issue date Jan 24, 2012
- ASML Netherlands B.V.
- Yvonne Wendela Kruijt-Stegeman
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,961,309
- Issue date Jun 14, 2011
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 7,878,791
- Issue date Feb 1, 2011
- ASML Netherlands B.V.
- Klaus Simon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods, systems, and computer program products for printing patter...
- Patent number 7,777,861
- Issue date Aug 17, 2010
- ASML Holding N.V.
- Azat Latypov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring asymmetry in a scatterometer, a method of measu...
- Patent number 7,656,518
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,586,598
- Issue date Sep 8, 2009
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 7,517,211
- Issue date Apr 14, 2009
- ASML Netherlands B.V.
- Yvonne Wendela Kruijt-Stegeman
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,502,103
- Issue date Mar 10, 2009
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method, and computer program product for ge...
- Patent number 7,500,218
- Issue date Mar 3, 2009
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless lithography systems and methods utilizing spatial light mo...
- Patent number 7,403,266
- Issue date Jul 22, 2008
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus
- Patent number 7,379,579
- Issue date May 27, 2008
- ASML Netherlands B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,349,068
- Issue date Mar 25, 2008
- ASML Netherlands B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems to compensate for a stitching disturbance of a...
- Patent number 7,259,831
- Issue date Aug 21, 2007
- ASML Holding, N.V.
- Azat Latypov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for printing large data flows
- Patent number 7,167,231
- Issue date Jan 23, 2007
- Micronic Laser Systems AB
- Anders Thurén
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,116,403
- Issue date Oct 3, 2006
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a device by employing a lithographic appara...
- Patent number 7,102,732
- Issue date Sep 5, 2006
- Elith LLC
- Pieter Willem Herman de Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for dose control in a lithographic system
- Patent number 7,046,413
- Issue date May 16, 2006
- ASML Holding N.V.
- Jason D. Hintersteiner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems to compensate for a stitching disturbance of a...
- Patent number 7,023,526
- Issue date Apr 4, 2006
- ASML Holding N.V.
- Azat Latypov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus
- Patent number 7,023,525
- Issue date Apr 4, 2006
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for dose control in a lithographic system
- Patent number 6,989,920
- Issue date Jan 24, 2006
- ASML Holding N.V.
- Jason D. Hintersteiner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,930,755
- Issue date Aug 16, 2005
- ASML Netherlands B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus
- Patent number 6,778,257
- Issue date Aug 17, 2004
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,633,366
- Issue date Oct 14, 2003
- Pieter Willem Herman de Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Environmental SEM with a magnetic field for improved secondary elec...
- Patent number 6,365,896
- Issue date Apr 2, 2002
- Philips Electron Optics B.V.
- Karel D. Van Der Mast
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Environmental SEM with a multiple fields for improved secondary ele...
- Patent number 6,184,525
- Issue date Feb 6, 2001
- Philips Electron Optics B.V.
- Karel D. Van Der Mast
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT LITHOGRAPHY
- Publication number 20140291879
- Publication date Oct 2, 2014
- ASML NETHERLANDS B.V.
- Yvonne Wendela Kruijt-Stegeman
- B82 - NANO-TECHNOLOGY
Information Patent Application
Metrology Apparatus, Lithography Apparatus and Method of Measuring...
- Publication number 20120092636
- Publication date Apr 19, 2012
- ASML NETHERLANDS B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT LITHOGRAPHY
- Publication number 20120091629
- Publication date Apr 19, 2012
- ASML NETHERLANDS B.V.
- Yvonne Wendela KRUIJT-STEGEMAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...
- Publication number 20120033223
- Publication date Feb 9, 2012
- ASML NETHERLANDS B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining Overlay Error and a Device Manufacturing Method
- Publication number 20100284008
- Publication date Nov 11, 2010
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Tool, System Comprising a Lithographic Apparatus and a Me...
- Publication number 20090296081
- Publication date Dec 3, 2009
- ASML NETHERLANDS B.V.
- Reinder Teun PLUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring asymmetry in a scatterometer, a method of measu...
- Publication number 20080239318
- Publication date Oct 2, 2008
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Metrology tool, system comprising a lithographic apparatus and a me...
- Publication number 20070279644
- Publication date Dec 6, 2007
- ASML NETHERLANDS B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology tool, system comprising a lithographic apparatus and a me...
- Publication number 20070279742
- Publication date Dec 6, 2007
- ASML NETHERLANDS B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imprint lithography
- Publication number 20070141191
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Yvonne Wendela Kruijt-Stegeman
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Imprint lithography
- Publication number 20070102844
- Publication date May 10, 2007
- ASML NETHERLANDS B.V.
- Klaus Simon
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060132742
- Publication date Jun 22, 2006
- ASML Netherland B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for printing large data flows
- Publication number 20060055903
- Publication date Mar 16, 2006
- Micronic Laser Systems AB
- Anders Thuren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method, and computer program product for ge...
- Publication number 20060040187
- Publication date Feb 23, 2006
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050286035
- Publication date Dec 29, 2005
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for dose control in a lithographic system
- Publication number 20050270613
- Publication date Dec 8, 2005
- ASML Holding N.V.
- Jason D. Hintersteiner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and systems to compensate for a stitching disturbance of a...
- Publication number 20050068509
- Publication date Mar 31, 2005
- ASML Holding, N. V.
- Azat Latypov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging apparatus
- Publication number 20050062948
- Publication date Mar 24, 2005
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050012916
- Publication date Jan 20, 2005
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging apparatus
- Publication number 20040239909
- Publication date Dec 2, 2004
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing a device by employing a lithographic appara...
- Publication number 20030206283
- Publication date Nov 6, 2003
- Applied Materials, Inc.
- Pieter Willem Herman de Jager
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20030179352
- Publication date Sep 25, 2003
- ASML NETHERLANDS B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging apparatus
- Publication number 20030030781
- Publication date Feb 13, 2003
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20020054284
- Publication date May 9, 2002
- Pieter Willem Herman de Jager
- B82 - NANO-TECHNOLOGY

Karel Diederick Van Der Mast

Person

Patents Grantslast 30 patents

Imprint lithography

Inspection method and apparatus, lithographic apparatus, lithograph...

Imprint lithography

Method of determining overlay error and a device manufacturing method

Imprint lithography

Metrology tool, system comprising a lithographic apparatus and a me...

Imprint lithography

Methods, systems, and computer program products for printing patter...

Method of measuring asymmetry in a scatterometer, a method of measu...

Metrology tool, system comprising a lithographic apparatus and a me...

Imprint lithography

Metrology tool, system comprising a lithographic apparatus and a me...

Lithographic apparatus, method, and computer program product for ge...

Maskless lithography systems and methods utilizing spatial light mo...

Imaging apparatus

Lithographic apparatus and device manufacturing method

Methods and systems to compensate for a stitching disturbance of a...

Method and apparatus for printing large data flows

Lithographic apparatus and device manufacturing method

Method of manufacturing a device by employing a lithographic appara...

System and method for dose control in a lithographic system

Methods and systems to compensate for a stitching disturbance of a...

Imaging apparatus

System and method for dose control in a lithographic system

Lithographic apparatus and device manufacturing method

Imaging apparatus

Lithographic apparatus, device manufacturing method, and device man...

Environmental SEM with a magnetic field for improved secondary elec...

Environmental SEM with a multiple fields for improved secondary ele...

Patents Applicationslast 30 patents

IMPRINT LITHOGRAPHY

Metrology Apparatus, Lithography Apparatus and Method of Measuring...

IMPRINT LITHOGRAPHY

Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...

Method of Determining Overlay Error and a Device Manufacturing Method

Metrology Tool, System Comprising a Lithographic Apparatus and a Me...

Method of measuring asymmetry in a scatterometer, a method of measu...

Metrology tool, system comprising a lithographic apparatus and a me...

Metrology tool, system comprising a lithographic apparatus and a me...

Imprint lithography

Imprint lithography

Lithographic apparatus and device manufacturing method

Method and apparatus for printing large data flows

Lithographic apparatus, method, and computer program product for ge...

Lithographic apparatus and device manufacturing method

System and method for dose control in a lithographic system

Methods and systems to compensate for a stitching disturbance of a...

Imaging apparatus

Lithographic apparatus and device manufacturing method

Imaging apparatus

Method of manufacturing a device by employing a lithographic appara...

Lithographic apparatus and device manufacturing method

Imaging apparatus

Lithographic apparatus, device manufacturing method, and device man...