Karen Mai

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Chunghe City, TW

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Patents Grantslast 30 patents

Information Patent Grant
Profile confinement to improve transistor performance
- Patent number 7,498,642
- Issue date Mar 3, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for integration of HfO2 and RTCVD poly-silicon
- Patent number 7,037,816
- Issue date May 2, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Min Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of forming the N-MOS and P-MOS gates of a CMOS semiconductor...
- Publication number 20060263992
- Publication date Nov 23, 2006
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Profile confinement to improve transistor performance
- Publication number 20060244080
- Publication date Nov 2, 2006
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20060154425
- Publication date Jul 13, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Ho Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and systems for rapid thermal processing
- Publication number 20060035477
- Publication date Feb 16, 2006
- Karen Mai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for integration of HfO2 and RTCVD poly-silicon
- Publication number 20050164445
- Publication date Jul 28, 2005
- Taiwan Semiconductor Manufacturing Co., LTD
- Yu Min Lin
- H01 - BASIC ELECTRIC ELEMENTS