Karin Eggers

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for dynamically monitoring a reticle
- Patent number 7,304,721
- Issue date Dec 4, 2007
- Infineon Technologies AG
- Henning Haffner
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Device for the storage and use of at least one photomask for lithog...
- Publication number 20070187272
- Publication date Aug 16, 2007
- Anja Bonness
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo mask and method to form a self-assembled monolayer and an ino...
- Publication number 20060257751
- Publication date Nov 16, 2006
- Karin Eggers
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for dynamically monitoring a reticle
- Publication number 20050125164
- Publication date Jun 9, 2005
- Henning Haffner
- G01 - MEASURING TESTING