Karl-Friedrich Doessel

Person

Wiesbaden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Copolymers comprising cyclic or polycyclic monomers having a specif...
- Patent number 5,612,434
- Issue date Mar 18, 1997
- Hoechst Aktiengesellschaft
- Ulrich Epple
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Magnetooptic layer and a process for its fabrication
- Patent number 5,527,605
- Issue date Jun 18, 1996
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Positive radiation-sensitive mixture and recording material produce...
- Patent number 5,403,697
- Issue date Apr 4, 1995
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-curable composition and radiation-sensitive recording mat...
- Patent number 5,234,791
- Issue date Aug 10, 1993
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of 3,5-disubstituted-4-acetoxystyrene
- Patent number 5,072,025
- Issue date Dec 10, 1991
- Hoechst Celanese Corporation
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive radiation-sensitive mixture containing monomeric acid-clea...
- Patent number 5,037,721
- Issue date Aug 6, 1991
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of 3,5-disubstituted-4-acetoxystyrene
- Patent number 4,965,400
- Issue date Oct 23, 1990
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive radiation-sensitive mixture and radiation-sensitive record...
- Patent number 4,946,759
- Issue date Aug 7, 1990
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxy...
- Patent number 4,933,495
- Issue date Jun 12, 1990
- Hoechst Celanese Corporation
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
3,5-disubstituted-4-acetoxystyrene and process for its production
- Patent number 4,927,956
- Issue date May 22, 1990
- Hoechst Celanese Corporation
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive radiation-sensitive mixture, using a monomeric silylenol e...
- Patent number 4,916,046
- Issue date Apr 10, 1990
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of 3-mono or 3,5-disubstituted-4-acetoxy...
- Patent number 4,868,256
- Issue date Sep 19, 1989
- Hoechst Celanese
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3-mono or 3,5 disubstituted-4-acetoxy...
- Patent number 4,868,257
- Issue date Sep 19, 1989
- Hoechst Celanese Corporation
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electrophotographic recording material having a photoconductive dou...
- Patent number 4,654,283
- Issue date Mar 31, 1987
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrophotographic recording material
- Patent number 4,525,444
- Issue date Jun 25, 1985
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Karl-Friedrich Doessel

Person

Patents Grantslast 30 patents

Copolymers comprising cyclic or polycyclic monomers having a specif...

Magnetooptic layer and a process for its fabrication

Positive radiation-sensitive mixture and recording material produce...

Radiation-curable composition and radiation-sensitive recording mat...

Process for the production of 3,5-disubstituted-4-acetoxystyrene

Positive radiation-sensitive mixture containing monomeric acid-clea...

Preparation of 3,5-disubstituted-4-acetoxystyrene

Positive radiation-sensitive mixture and radiation-sensitive record...

Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxy...

3,5-disubstituted-4-acetoxystyrene and process for its production

Positive radiation-sensitive mixture, using a monomeric silylenol e...

Process for the production of 3-mono or 3,5-disubstituted-4-acetoxy...

Process for the production of 3-mono or 3,5 disubstituted-4-acetoxy...

Electrophotographic recording material having a photoconductive dou...

Electrophotographic recording material