Karl-Heinz Schuster

Person

Bad Wurzach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element
- Patent number 10,606,078
- Issue date Mar 31, 2020
- tooz technologies GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric measuring arrangement
- Patent number 10,337,850
- Issue date Jul 2, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 9,436,095
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring an optical system
- Patent number 8,786,849
- Issue date Jul 22, 2014
- Carl Zeiss SMT GmbH
- Thomas Korb
- G01 - MEASURING TESTING
Information Patent Grant
Microscope imaging system and method for emulating a high aperture...
- Patent number RE44216
- Issue date May 14, 2013
- Carl Zeiss SMS GmbH
- Michael Totzeck
- 359 - Optical: systems and elements
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 8,330,935
- Issue date Dec 11, 2012
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,325,426
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Optical system of an illumination device of a projection exposure a...
- Patent number 8,068,279
- Issue date Nov 29, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection objective and method for optimizing a system aperture st...
- Patent number 8,049,973
- Issue date Nov 1, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,023,104
- Issue date Sep 20, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Catadioptric objective
- Patent number RE42570
- Issue date Jul 26, 2011
- Carl Zeiss SMT GmbH
- Karl Heinz Schuster
- 359 - Optical: systems and elements
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,982,969
- Issue date Jul 19, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,977,651
- Issue date Jul 12, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High-NA projection objective with aspheric lens surfaces
- Patent number 7,787,177
- Issue date Aug 31, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection objective having a high aperture and a planar end surface
- Patent number 7,782,538
- Issue date Aug 24, 2010
- Carl Zeiss SMT AG
- Susanne Beder
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithography optical system
- Patent number 7,764,427
- Issue date Jul 27, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective with crystal lens
- Patent number 7,755,839
- Issue date Jul 13, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection objective and method for optimizing a system aperture st...
- Patent number 7,751,127
- Issue date Jul 6, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Catadioptric objective comprising two intermediate images
- Patent number RE41350
- Issue date May 25, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- 359 - Optical: systems and elements
Information Patent Grant
Catadioptric projection objective
- Patent number 7,697,198
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,592,598
- Issue date Sep 22, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,570,343
- Issue date Aug 4, 2009
- Carl Zeis SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography lens system and projection exposure system provided wit...
- Patent number 7,551,361
- Issue date Jun 23, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,532,306
- Issue date May 12, 2009
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Very high-aperture projection objective
- Patent number 7,495,840
- Issue date Feb 24, 2009
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Illumination system for a wavelength of ≦ 193 nm, with sensors for...
- Patent number 7,473,907
- Issue date Jan 6, 2009
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement of optical elements in a microlithographic projection e...
- Patent number 7,474,469
- Issue date Jan 6, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Projection objective having a high aperture and a planar end surface
- Patent number 7,466,489
- Issue date Dec 16, 2008
- Susanne Beder
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,460,206
- Issue date Dec 2, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
INTERFEROMETRIC MEASURING ARRANGEMENT
- Publication number 20180106591
- Publication date Apr 19, 2018
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
OPTICAL ELEMENT
- Publication number 20180031839
- Publication date Feb 1, 2018
- CARL ZEISS SMART OPTICS GMBH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20170082930
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20160131980
- Publication date May 12, 2016
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN OPTICAL SYSTEM
- Publication number 20130271749
- Publication date Oct 17, 2013
- Thomas KORB
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20130120723
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110235013
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE ST...
- Publication number 20100214551
- Publication date Aug 26, 2010
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20100141912
- Publication date Jun 10, 2010
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100045952
- Publication date Feb 25, 2010
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090316128
- Publication date Dec 24, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
HIGH-NA PROJECTION OBJECTIVE WITH ASPHERIC LENS SURFACES
- Publication number 20090296204
- Publication date Dec 3, 2009
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20090284831
- Publication date Nov 19, 2009
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
- Publication number 20090213342
- Publication date Aug 27, 2009
- Carl Zeiss SMT AG
- Hans-Joachim Weippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090073410
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OBJECTIVE HAVING A HIGH APERTURE AND A PLANAR END SURFACE
- Publication number 20090059385
- Publication date Mar 5, 2009
- Carl Zeiss SMT AG
- Susanne Beder
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090015812
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20080316452
- Publication date Dec 25, 2008
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20080309894
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITOGRAPHIC PROJECTION EXPOSURE APPARATUS AND IMMERSION LIQUID...
- Publication number 20080304032
- Publication date Dec 11, 2008
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20080297745
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Karl-Stefan WEISSENRIEDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20080291419
- Publication date Nov 27, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging System
- Publication number 20080259441
- Publication date Oct 23, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
Image-projecting system, such as a projection objective of a microl...
- Publication number 20080182210
- Publication date Jul 31, 2008
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20080174759
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE ST...
- Publication number 20080165426
- Publication date Jul 10, 2008
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
IMAGING SYSTEM, IN PARTICULAR A PROJECTION OBJECTIVE OF A MICROLITH...
- Publication number 20080151381
- Publication date Jun 26, 2008
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20080130076
- Publication date Jun 5, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Catadioptric Projection Objective
- Publication number 20080037111
- Publication date Feb 14, 2008
- David Shafer
- G02 - OPTICS

Karl-Heinz Schuster

Person

Patents Grantslast 30 patents

Optical element

Microlithographic projection exposure apparatus and measuring devic...

Interferometric measuring arrangement

Exposure apparatus and measuring device for a projection lens

Method for measuring an optical system

Microscope imaging system and method for emulating a high aperture...

Exposure apparatus and measuring device for a projection lens

Projection objective of a microlithographic projection exposure app...

Optical system of an illumination device of a projection exposure a...

Projection objective and method for optimizing a system aperture st...

Microlithographic projection exposure apparatus

Catadioptric objective

Projection objective of a microlithographic projection exposure app...

Illumination system particularly for microlithography

High-NA projection objective with aspheric lens surfaces

Projection objective having a high aperture and a planar end surface

Microlithography optical system

Microlithography projection objective with crystal lens

Projection objective and method for optimizing a system aperture st...

Catadioptric objective comprising two intermediate images

Catadioptric projection objective

Illumination system particularly for microlithography

Microlithographic projection exposure apparatus

Lithography lens system and projection exposure system provided wit...

Microlithographic projection exposure apparatus

Very high-aperture projection objective

Illumination system for a wavelength of ≦ 193 nm, with sensors for...

Arrangement of optical elements in a microlithographic projection e...

Projection objective having a high aperture and a planar end surface

Projection objective for immersion lithography

Patents Applicationslast 30 patents

INTERFEROMETRIC MEASURING ARRANGEMENT

OPTICAL ELEMENT

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD FOR MEASURING AN OPTICAL SYSTEM

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE ST...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

HIGH-NA PROJECTION OBJECTIVE WITH ASPHERIC LENS SURFACES

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

PROJECTION OBJECTIVE HAVING A HIGH APERTURE AND A PLANAR END SURFACE

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

MICROLITOGRAPHIC PROJECTION EXPOSURE APPARATUS AND IMMERSION LIQUID...

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

Imaging System

Image-projecting system, such as a projection objective of a microl...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE ST...

IMAGING SYSTEM, IN PARTICULAR A PROJECTION OBJECTIVE OF A MICROLITH...

Illumination system particularly for microlithography

Catadioptric Projection Objective