Karl Hornik

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Laaber, DE

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Patents Grantslast 30 patents

Information Patent Grant
Minimizing low-k dielectric damage during plasma processing
- Patent number 7,691,736
- Issue date Apr 6, 2010
- Infineon Technologies AG
- Michael Beck
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Minimizing low-k dielectric damage during plasma processing
- Publication number 20070190804
- Publication date Aug 16, 2007
- Michael Beck
- H01 - BASIC ELECTRIC ELEMENTS